Erratum to: Toward multiscale modeling of thin-film growth processes using SLKMC

The Original Article is available

doi: https://doi.org/10.1557/jmr.2018.44, Published by Materials Research Society with Cambridge University Press, 28 March 2018.

The paper by Acharya and Rahman1 was inadvertently published in Volume 33, Issue 6 of Journal of Materials Research. The article is part of the Journal of Materials Research Focus Issue on Advanced Atomistic Algorithms in Materials Science and is referenced as such in the introduction to that issue.2

The publishers apologize for the error.

References

  1. 1.

    S.R. Archarya and T.S. Rahman: Toward multiscale modeling of thin-film growth processes using SLKMC. J. Mater. Res. 33, 709–719 (2018). doi: https://doi.org/10.1557/jmr.2018.44.

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  2. 2.

    E. Martinez, D. Perz, V. Gavani, and S. Kenny: Introduction. J. Mater. Res. 33, 773–776 (2018). doi: https://doi.org/10.1557/jmr.2018.69.

    CAS  Article  Google Scholar 

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The original article can be found online at https://doi.org/10.1557/jmr.2018.44

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Acharya, S.R., Rahman, T.S. Erratum to: Toward multiscale modeling of thin-film growth processes using SLKMC. Journal of Materials Research 33, 872 (2018). https://doi.org/10.1557/jmr.2018.68

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