Measurement of Stress-strain Curves of PECVD Silicon Oxide Thin Films by Means of Nanoindentation

Abstract

In this paper, we explore the use of nanoindentation techniques as a method of measuring equivalent stress-strain curves of the PECVD SiOx thin films. Three indenter tips with different geometries were adopted in our experiments, enabling us to probe different regimes of plastic deformation in the PECVD SiOx thin films. A shear transformation zone (STZ) based amorphous plasticity theory is applied to depict the underlying plastic deformation mechanism.

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References

  1. 1.

    M. Madou, Fundamentals of Microfabrication: The Science of Miniaturization, 2nd ed. (CRC Press, Boca Raton, 2002).

    Google Scholar 

  2. 2.

    A. H. Epstein and S.D. Senturia, Science 276, 1211 (1997).

    CAS  Article  Google Scholar 

  3. 3.

    Z. Cao and X. Zhang, J. Appl. Phys. 96, 4273 (2004) and the references therein.

    CAS  Article  Google Scholar 

  4. 4.

    L. B. Freund and S. Suresh, Thin Film Materials: Stress, Defect Formation and Surface Evolution (Cambridge University Press, New York, 2004).

    Google Scholar 

  5. 5.

    W. C. Oliver and G.M. Pharr, J. Mater. Res. 19, 3 (2004) and the references therein.

    CAS  Article  Google Scholar 

  6. 6.

    A. K. Bhattacharya and W D Nix, Int. J. Solids Structures 24, 1287 (1988).10.1016/0020-7683(88)90091-1

    Article  Google Scholar 

  7. 7.

    A. F. Bower, N.A. Fleck, A. Needleman and N. Ogbonna, Proc. R. Soc. Lond. A 441, 97 (1993).

    Article  Google Scholar 

  8. 8.

    H. Li and A.H.W. Ngan, J. Mater. Res. 19, 513 (2004).

    CAS  Article  Google Scholar 

  9. 9.

    D. Tabor, The Hardness of Metals, Clarendon Press, Oxford, 1951.

    Google Scholar 

  10. 10.

    K. L. Johnson, J. Mech. Phys. Solids 18, 115 (1970).

    Article  Google Scholar 

  11. 11.

    R. Hill, Proc. R. Soc. Lond. A 436 617 (1992).

    Article  Google Scholar 

  12. 12.

    W. H. Poisl, W.C. Oliver and B.D. Fabes, J. Mater. Res. 10, 2024 (1995).

    CAS  Article  Google Scholar 

  13. 13.

    B. Storåkers and P.L. Larsson, J. Mech. Phys. Solids 42, 307 (1994).

    Article  Google Scholar 

  14. 14.

    F. Spaepen, Acta Metall. 25, 407 (1977).10.1016/0001-6160(77)90232-2

    CAS  Article  Google Scholar 

  15. 15.

    A. S. Argon, Acta Metall, 27, 47 (1979).

    CAS  Article  Google Scholar 

  16. 16.

    M. L. Falk and J.S. Langer, Phys. Rev. E 57, 7192 (1998).

    CAS  Article  Google Scholar 

  17. 17.

    J. S. Langer, Phys. Rev. E 64, 011504 (2001).

    CAS  Article  Google Scholar 

  18. 18.

    E. Martínez, J. Romero, A. Lousa and J. Esteve, Appl. Phys. A 77, 419 (2003).

    Article  Google Scholar 

  19. 19.

    T. H. Courtney, Mechanical Behavior of Materials, 2nd ed., McGraw Hill Press, Boston, 2000.

    Google Scholar 

  20. 20.

    D. C. Drucker, Proc. 1st US Natl. Congress Appl. Mech (Chicago, 1951), p.487, A.S.M.E. Press, New York, 1952.

    Google Scholar 

  21. 21.

    C. A. Schuh and T.G. Nieh, J. Mater. Res. 19, 46 (2004) and the references therein.

    CAS  Article  Google Scholar 

Download references

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Correspondence to Zhiqiang Cao.

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Cao, Z., Zhang, X. Measurement of Stress-strain Curves of PECVD Silicon Oxide Thin Films by Means of Nanoindentation. MRS Online Proceedings Library 977, 423 (2006). https://doi.org/10.1557/PROC-977-0977-FF04-23

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