This is a preview of subscription content, access via your institution.
References
- 1.
E.L. Kern, L.S. Yaggy and J.A. Baker, Semiconductor Silicon 1977, Electrochemical Society, Princeton, N.J., 1977, p. 52.
- 2.
“Float Zone Workshop”, Ed. E.L. Kern, NASA- Marshall Space Flight Center (to be published), (September, 1981).
- 3.
P. Rava, H.C. Gatos and J. Lagowski, Semiconductor Silicon 1981, Ed. H. Huff, R. Kriegler and Y. Takeishi (Electrochemical Society, Princeton, N.J.).
- 4.
K. Graff, J. Hilgarth and H. Neubrand, Semiconductor Silicon 1977, Ed. H. Huff and E. Sirtl (Electrochemical Society, Princeton, N.J.), p. 575.
- 5.
H. Foil, U. Gosele and B. Kolbesen, Semiconductor Silicon 1977, Ed. H. Huff and E. Sirtl. (Electrochemical Society, Princeton, N.J.), p. 565.
- 6.
A.J.R. DeKock, P.J. Roksnoer and P.G.T. Boonen, J. Crystal Growth 22, (1974) 311–20.
- 7.
F. Vieweg-Gutberlet, “Local Distribrution of Oxygen in Silicon Single Crystals and Swirl Formation” International conf. on Lattice Defects in Semiconductors, Freiburg, W. Germany, (July 1974), p. 22–25.
- 8.
E.L. Kern, paper A-1, Conference on Preparation and Properties of Electronic Materials, A.I.M.E., Boston Mass. (September 9, 1974).
- 9.
M. Kamper, “A New Striation Etch for Silicon”, J. Electrochemical Society, 117 no. 2 (February 1970).
Acknowledgements
The present studies were sponsored by NASA on a consulting basis. The resistivity and etching striation studies were performed at the Hughes Research Labs.
Author information
Affiliations
Rights and permissions
About this article
Cite this article
Kern, E.L. Increased Uniformity of Silicon Needed for Critical Devices How Can We Improve the Float-Zone Process?. MRS Online Proceedings Library 9, 445–447 (1981). https://doi.org/10.1557/PROC-9-445
Published:
Issue Date: