Excimer Laser Crystallized HWCVD Thin Silicon Films: Electron Field Emission


Thin silicon films deposited using the Hot-Wire Chemical Vapor Deposition (HWCVD) technique are studied here for the effect of XeCl excimer laser crystallization on their structural, optoelectronic, and electron field emission properties. Excimer Laser Annealing (ELA) of the silicon thin films indicated increased dark conductivity and reduced optical gap. Encouraging Field Emission (FE) results were obtained from XeCl excimer laser processed HWCVD films on Cr, V, Mo, and Ti backplanes. Geometric field enhancement factors from surface measurements and Fowler-Nordheim Theory (FNT) were compared. FE thresholds were also found to be particularly influenced by the backplane material.

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  1. [1]

    J.D. Carey and S.R.P Silva, Appl. Phys. Lett. 78 (3), 347 (2001).

    CAS  Article  Google Scholar 

  2. [2]

    A. Buldum and J.P. Lu, Phys. Rev. Lett. 91 (23), 236801 (2003).

    Article  Google Scholar 

  3. [3]

    Y.B. Li, Y. Bando, D. Golberg, Appl. Phys. Lett. 82 (12), 1962 (2003).

    CAS  Article  Google Scholar 

  4. [4]

    S.R.P. Silva, R.D. Forrest, J.M. Shannon, J. Vac. Sci. Technol. B 17, 596 (1999).

    Article  Google Scholar 

  5. [5]

    Y.F. Tang, S. R. P. Silva, M. J. Rose, Appl. Phys. Lett. 80 (22), 4154–4156 (2002).

    CAS  Article  Google Scholar 

  6. [6]

    S.K. Persheyev, D.M. Goldie, M.J. Rose, Thin Solid Films 395, 130–133 (2001).

    CAS  Article  Google Scholar 

  7. [7]

    S.R. Jadkar, J.V. Sali, M.G. Takwale, Thin Solid Films 395, 206–212 (2001).

    CAS  Article  Google Scholar 

  8. [8]

    D. Toet, T. Takehara, M.O. Thompson, J. App. Phys. 85 (11), (1999).

  9. [9]

    A. Poruba, A. Fejfar, J. App. Phys. 88 (1), (2000).

  10. [10]

    D.S. Mao and J.Y. Zhou et al, J. Vac. Sci Technol. B} 17 (2), 311 (1999).

    CAS  Article  Google Scholar 

  11. [11]

    P. Alpuim and J.P. Conde, J. App. Phys. 86 (7), (1999).

  12. [12]

    Yusuke Yogoro, Atsushi Masuda, Hideki Matsumura, Thin Solid Films, 430 (2003).

  13. [13]

    Daxing Han, H. Habuchi, Qi Wang, J.App. Phys. 87 (4), 1882–1888 (1999).

    Article  Google Scholar 

  14. [14]

    P. Lerner and N.M. Miskovsky, J. Vac. Sci. Technol. B 16, 900 (1998).

    CAS  Article  Google Scholar 

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Correspondence to M. Z. Shaikh.

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Shaikh, M.Z., O’Neill, K.A., Persheyev, S.K. et al. Excimer Laser Crystallized HWCVD Thin Silicon Films: Electron Field Emission. MRS Online Proceedings Library 862, 68 (2004). https://doi.org/10.1557/PROC-862-A6.8

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