Download PDF

High Density Plasma Processing of Microcrystalline Si Thin Films

MRS Online Proceedings Library volume 862, Article number: 193 (2004) Cite this article

Abstract

In the present work, we report on the fabrication of high quality microcrystalline Si thin films by high-density PECVD technique. The typical deposition rate of the HD-PECVD μ-Si thin films was greater than 350 Å/min in the H2/SiH4 ratio range of 20–100. For a 150-nm-thick film deposited at a H2/SiH4 ratio of 20, the typical microcrystalline volume fraction and the average crystallite size corresponding to <111> orientation were 75% and 160 A, respectively. The observed growth and properties of the μ-Si thin films show the potential of the high-density PECVD technique for the low temperature processing of high quality films with superior control of bulk and interfacial characteristics.

References

  1. 1

    R. E. I. Schropp and M. Zeman, Amorphous and Microcrystalline Silicon Solar Cells (Kluwer, Boston, 1998).

    Google Scholar 

  2. 2

    S. Summers, H. S. Reehal, and G. H. Shirkoohi, J. Phys. D: Appl. Phys. 34, 2782 (2001).

    CAS  Article  Google Scholar 

  3. 3

    S. Mukhopadhyay, C. Das, and S. Ray, J. Phys. D: Appl. Phys. 37, 1736 (2004).

    CAS  Article  Google Scholar 

  4. 4

    M. Kondo, S. Suzuki, Y. Nasuno, and A. Matsuda, Mat. Res. Soc. Symp. Proc. Vol. 664, A4.3 (2001).

    Article  Google Scholar 

Download references

Author information

Affiliations

  1. LCD Process Technology Laboratory, SHARP Laboratories of America, Inc., 5700 NW Pacific Rim Blvd., Camas, WA, 98607, USA

    P. C. Joshi, A. T. Voutsas & J. W. Hartzell

Authors
  1. P. C. Joshi
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. A. T. Voutsas
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. J. W. Hartzell
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to P. C. Joshi.

Rights and permissions

Reprints and Permissions

About this article

Verify currency and authenticity via CrossMark

Cite this article

Joshi, P.C., Voutsas, A.T. & Hartzell, J.W. High Density Plasma Processing of Microcrystalline Si Thin Films. MRS Online Proceedings Library 862, 193 (2004). https://doi.org/10.1557/PROC-862-A19.3

Download citation