Fabrication of Nano-Crystalline Porous Silicon on Si Substrates by a Plasma Enhanced Hydrogenation Technique


A novel plasma hydrogenation method for the fabrication of nano-crystalline structures of silicon as well as the photoluminescence and structural properties of these porous structures is presented. We have observed that the hydrogenation process followed by an annealing treatment results in the formation of nano-crystalline silicon structures where increased temperatures during hydrogenation reduces the grain size. Furthermore, by increasing the time of the hydrogenation process, the density of the silicon grains is increased. Photoluminescence (PL) spectroscopy demonstrated the presence of a direct gap in the visible light range where materials with a smaller grain size emitted light at lower wavelengths, and a higher density of grains resulted in higher amplitudes in the PL spectrum. TEM and SEM characterization of these samples and the structure-emission relationship are also presented.

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This work has been supported with a grant from the Iranian Ministry of Industry and partial support from the Research Council of the University of Tehran. M.D.R. gratefully acknowledges the support of the Canada Research Chairs Program and the Natural Sciences and Engineering Research Council of Canada.

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Correspondence to Y. Abdi.

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Abdi, Y., Hashemi, P., Karbassian, F. et al. Fabrication of Nano-Crystalline Porous Silicon on Si Substrates by a Plasma Enhanced Hydrogenation Technique. MRS Online Proceedings Library 862, 191 (2004). https://doi.org/10.1557/PROC-862-A19.1

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