Abstract
TiO2 thin films (500–1000 nm in thickness) were deposited using pulsed DC magnetron reactive sputtering, on glass substrates. The depositions used a Ti source in an Ar+O2 gas mixture with different parameters of power (350 - 500W), substrate temperature (no additional heat - 400°C), growth pressure (3.0 - 5.0 mTorr) and oxygen gas flow rate (6.0 - 8.0 sccm). The x-ray diffractions (XRD) show amorphous and/or anatase phases depending on the deposition conditions. The films were found to be amorphous at lower substrate temperature and at lower powers. The sample with 4 mTorr, 400W of power, a substrate temperature of 250 C with 7.0 sccm of oxygen flow has the best crystalline quality. The temperature dependent electrical conductivity measurement in air for the above films shows an exponential increase in conductivity with temperature.
Similar content being viewed by others
References
D. Mergel, D. Buschendorf, S. Eggert, R. Grammes, B. Samset, Thin Solid Films 371 (2000) 218.
K.D. Rogers, D.W. Lane, J.D. Painter, A. Chapman, Thin Solid Films 466 (2004) 97.
Peng Jun, Liu Duren, Sensors and Actuators B 66 (2000) 210.
Marta Radecka, Katarzyna Zakrzewska, Mieczyslaw Rekas, Sensors and Actuators B 47 (1998) 194.
M. Ferroni, V. Guidi, G. Martinelli, G. Faglia, P. Nelli, G. Sberveglieri, NanoStructured Materials, Vol. 7. No. 7 (1996) 709.
H. Tang, K. Prasad, R. Sanjines, F. Levy, Sensors and actuators B 26-27 (1995) 71.
M.C. Carotta, M. Ferroni, D. Gnani, V. Guidi, M. Merli, G. Martinelli, M.C. Casale, M. Notaro, Sensors and Actuators B 58 (1999) 310.
L. Miao, P. Jin, K. Kaneko, A. Terai, N. Nabatova-Gabain, S. Tanemura, Applied Surface Science, 212 (2003) 255.
T. Sekiya, S. Ohta, S. Kamei, M. Hanakawa, S. Kurita, Journal of Physics and Chemistry of Solids, 62 (2001) 717.
Jean M. Bennett, Emile Pelletier, G. Albrand, J. P. Borgogno, B. Lazarides, Charles K. Carniglia, R. A. Schmell, Thomas H. Allen, Trudy Tuttle-Hart, Karl H. Guenther, and Andreas Saxer, Applied Optics vol. 28, No. 15, 1989.
Shunjiro Ikezawa, Futoshi Mutsuga, Takanori Kubota, Ren Suzuki, Kiyohide Baba, Shinken Koh, Toshitaro Yoshioka, Akira Nishiwaki, Keisuke Kida, Yoshihiko Ninomiya, Koichi Wakita, Vacuum 59 (2000) 514.
H. Yamashita, M. Harada, J. Misaka, H. Nakao, M. Takeuchi, M. Anpo, Nuclear Instruments and Methods in Physics Research B 206 (2003) 889.
JCPDS, International Center for Diffraction Data, 1995-2000, USA.
B. D. Cullity, Elements of x-ray diffraction, second edition, Addison-wesley, USA 1978.
Bernd Huber, Hubert Gnaser, Christiane Ziegler, Surface Science 566 (2004) 419.
Bernd Huber, Alexander Brodyanski, Michael Scheib, Adam Orendorz, Christiane Ziegler, Hubert Gnaser, Thin Solid Films (2004) article in press.
T.H. Dittrich, J. Weidmann, V. Yu. Timoshenko, A.A. Petrov, F. Koch, M.G. Lisachenko, E. Lebedev, Materials Science and Engineering B 69 (2000) 489.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Al-Homoudi, I.A., Zhang, L., McCullen, E.F. et al. Fabrication of Anatase TiO2 Thin Film Using Pulsed DC Magnetron Sputtering. MRS Online Proceedings Library 848, 187–192 (2004). https://doi.org/10.1557/PROC-848-FF3.20
Published:
Issue Date:
DOI: https://doi.org/10.1557/PROC-848-FF3.20