Surface Roughness Evolution in Amorphous Tantalum Oxide Films Deposited by Pulsed Reactive Sputtering

Abstract

The growth front roughness of Ta2O5 amorphous films grown by pulsed plasma d.c. reactive sputtering has been investigated using atomic force microscopy. Film deposition during reactive sputter deposition is explained based on dynamic scaling hypothesis in which both time and space scaling are considered simultaneously. The interface width w increases as a power law with deposition time t, w ∼ tβ, with β = 0.45 ± 0.03. The lateral correlation length ξ grows as ξ ∼ t1/z, with 1/z = 0.61 ± 0.07. The roughness exponent extracted from the slope of height-height correlation analysis is α = 0.79 ± 0.04. The results are similar to that obtained by sputtering of elemental materials, and do not fit to any of the presently known growth models. Monte Carlo simulations were carried out based on a recently developed re-emission model, where incident flux distribution, shadowing, sticking coefficient, and surface diffusion mechanisms were accounted for in the deposition process. An important finding is that sticking coefficient must be less than unity to obtain the observed β value (∼0.45).

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References

  1. 1.

    C. Hashimoto, H. Oikawa, and N. Honma, IEEE Trans. Electron Devices 36, 14 (1989).

    CAS  Article  Google Scholar 

  2. 2.

    G. Q. Lo, D. L. Kwong, P. C. Fazan, V. K. Mathews, and N. Sandler, IEEE Electron Device Lett. 14, 216 (1993).

    CAS  Article  Google Scholar 

  3. 3.

    C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, Mater. Sci. Eng. R. 22, 269 (1998).

    Article  Google Scholar 

  4. 4.

    J.-Y. Kim, A. Garg, E.J. Rymaszewski, and T.-M. Lu, IEEE Trans. Comp. Packag. Technol. 24 (3), 526 (2001).

    CAS  Article  Google Scholar 

  5. 5.

    Y.–P. Zhao, G.-C Wang, T.-M Lu, G. Palasantas, and J. Th. M. De Hosson, Phys. Rev. B60, 9157 (1999).

  6. 6.

    J.T. Drotar, Y.–P. Zhao, T.-M Lu, and G.-C Wang, Phys. Rev. B61, 3012 (2000).

  7. 7.

    J.T. Drotar, Y.–P. Zhao, T.-M Lu, and G.-C Wang, Phys. Rev. B62, 2118 (2000).

  8. 8.

    X. M. Wu, P. K. Wu, T.-M lu, and E. J. Rymaszewski, Appl. Phys. Lett. 62 (25), 3264 (1993).

    CAS  Article  Google Scholar 

  9. 9.

    M. C. Nielsen, J.-Y Kim, E. J. Rymaszewski, T-M Lu, A. Kumar, and H. Bakhru, IEEE Trans. Comp., Packag. Manufact. Technol. B. 21 (3), 274 (1998).

    CAS  Article  Google Scholar 

  10. 10.

    W. D. Sproul, M. E. Graham, M. S. Wong, S. Lopez, D. Li, and R. A. Scholl, J. Vac. Sci. Technol. A 13, 1188 (1995).

    CAS  Article  Google Scholar 

  11. 11.

    T.-M. Lu, H.-N. Yang, and G.-C. Wang, in Fractal Aspects of Materials, edited by F. Family, P. Meakin, B. Sapoval, and R. Wool, Mat. Res. Soc. Symp. Proc. 367, 283 (1995).

    CAS  Article  Google Scholar 

  12. 12.

    Y.-P. Zhao, G.-C. Wang, and T.-M. Lu, Characterization of Amorphous and Crystalline Rough Surfaces: Principles and Applications, (Academic Press, San Diego, 2000).

  13. 13.

    J. Aue and J. Th. M. De Hosson, Appl. Phys. Lett. 71, 1347 (1997).

    CAS  Article  Google Scholar 

  14. 14.

    Q.M. Hudspeth, K.P. Nangle, Y.-P. Zhao, T. Karabacak, , C.V. Nguyen, M. Meyyappan, G.-C. Wang, and T.-M. Lu, Surface Science, 515/2–3, 453–461(2002).

  15. 15.

    A.-L. Barabasi and H. E. Stanley, Fractal Concepts in Surface Growth (Cambridge University, Cambridge, England, 1995.

  16. 16.

    See Refs. 3 and H. You, R. P. Chiarello, H. K. Kim, and K. G. Vadervoort, Phys. Rev. Lett 70, 2900 (1993); A. E. Lita and J. E. Sanchez, Phys. Rev. B61, 7692 (2000); A. E. Lita and J. E. Sanchez, J. Appl. Phys. 85, 876 (1999).

    Article  Google Scholar 

  17. 17.

    F. Family and T. Vicsek, Dynamics of Fractal Surfaces (World Scientific, Singapore, 1991).

  18. 18.

    R. P. U. Karunasiri, R. Bruinsma, and J. Rudnick, Phys. Rev. Lett. 62, 788 (1989).

    CAS  Article  Google Scholar 

  19. 19.

    J.-H. Yao and H. Guo, Phys. Rev. E 47, 1007 (1993).

    CAS  Article  Google Scholar 

  20. 20.

    T. Karabacak, Y.-P. Zhao, G.-C. Wang, T.-M. Lu, Phys. Rev. B66, 075329 (2002).

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Correspondence to Pushkar Jain.

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Jain, P., Juneja, J.S., Karabacak, T. et al. Surface Roughness Evolution in Amorphous Tantalum Oxide Films Deposited by Pulsed Reactive Sputtering. MRS Online Proceedings Library 749, 511 (2002). https://doi.org/10.1557/PROC-749-W5.11

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