Real-time x-ray scattering study of homoepitaxial growth of SrTiO3 by sputtering

Abstract

The real-time x-ray scattering measurements under in-situ sputtering conditions were employed to study the growth behavior of sputter-deposited SrTiO3 films on SrTiO3 (001) substrate. A condition for conformal growth between deposited layers and substrate was found by observing the oscillation fringe in the diffuse scattering of measured reflectivity. The azimuthal scan around surface Bragg peak of the film peak shows that the epitaxial relationship between film and substrate can be achieved by sputtering.

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Lee, HY., Hsu, CH., Hsieh, YW. et al. Real-time x-ray scattering study of homoepitaxial growth of SrTiO3 by sputtering. MRS Online Proceedings Library 749, 1714 (2002). https://doi.org/10.1557/PROC-749-W17.14

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