Comparative Studies of Thin-Film Ti-Si and Ti-SiO2 Rapid Thermal Reactions Using the RIP/TEM Technique


One requirement of self-aligned microelectronics metallization processes is selectivity of reactions, e.g., a deposited, thin metal film must react with Si to form a silicide, yet avoid reaction with SiO2 Rapid thermal processing (RTP) techniques may enhance selectivity by utiliz-ing differences in competing reaction kinetics. In this paper, we apply the RTP/transmission electron microscopy (RTP/TEM) technique to determine processing temperature (T)/time (t) “win-dows” for selective sulicide formation in Ti-Si vs Ti-SiO2 reactions. Free-lying Si/Ti/Si and SiO2/Ti/SiO2 films deposited on electron microscope grids were RTP'd in pairs and immediately examined by TEM. The products of the interfacial reactions, their sequence of appearance, and the T/t conditions for silicide nucleation and growth in each system are described.

This is a preview of subscription content, access via your institution.


  1. 1.

    C. K. Lau, Y. C. See, D. B. Scott, J. M. Bridger, S. M. Perna and R. D. Davies, IEDM Tech. Dlg. 714, Dec. (1982).

  2. 2.

    R. Beyers, J. Appl . Phys., 56, 147 (1984).

    CAS  Article  Google Scholar 

  3. 3.

    L. J. Brillson, M. L. Slade, H. W. Richter, H. Vander Plas and R. T. Fulks, Appl. Phys. Lett. 47, 1080 (1985).

    CAS  Article  Google Scholar 

  4. 4.

    M. Natan, in “Thin Films-Interfaces and Characterization”, MRS Symposia Proceedings, vo1. 54, 115 (1985); Appl. Phys. Lett. 49, 257 (1986).

  5. 5.

    C.-D. Lien, M.-A Nicolet and S. S. Lau, Thin Solid Films, 143, 63 (1986).

    CAS  Article  Google Scholar 

  6. 6.

    L. S. Hung, J. Gyulai, J. W. Mayer, S. S. Lau and M.-A. Nicolet, J. Appl. Phys., 54, 5076, (1983).

    CAS  Article  Google Scholar 

  7. 7.

    B. S. Lim, E. Ma, M.-A. Nicolet and M. Natan, to be published in Rev. Sci. Instrum.

  8. 8.

    R. Beyers and R. Sinclair, J. Appl. Phys., 57, 5240 (1985).

    CAS  Article  Google Scholar 

Download references

Author information



Rights and permissions

Reprints and Permissions

About this article

Cite this article

Natan, M. Comparative Studies of Thin-Film Ti-Si and Ti-SiO2 Rapid Thermal Reactions Using the RIP/TEM Technique. MRS Online Proceedings Library 74, 679 (1986).

Download citation