Currently, there is considerable interest in producing patterned metallic structures with reduced dimensions for use in technologies such as ultra large scale integration (ULSI) device fabrication, nanoelectromechanical systems (NEMS), and arrayed nanosensors, without sacrificing throughput or cost effectiveness. Research in our laboratory has focused on the preparation of precious metal thin films on semiconductor substrates via electroless deposition. This method provides for the facile interfacing of metal nanoparticles with a group (IV) and III-IV compound semiconductor surfaces. Morphologically complex films composed of gold, platinum, and palladium nanoparticles have been prepared as a result of the immersion of germanium and gallium arsenide substrates into dilute, aqueous solutions of tetrachloraurate (III), tetrachloroplatinate (II), and tetrachloropalladate (II), respectively. Continuous metallic films form spontaneously under ambient conditions, in the absence of a fluoride source or an externally applied current. This facile electroless deposition methodology provides an alternative to complex and expensive vacuum methods of metallization, yet allows for the preparation of both thin and thick nanostructured films with control over surface morphology and deposition rate. Furthermore, precious metal films prepared in this way exhibit excellent adhesion to the underlying semiconductor substrate. The resultant films were characterized utilizing scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and scanning probe microscopy (SPM). In order to apply this novel metallization method toward the development of useful technologies, patterning utilizing photolithography, microcontact printing (μCP), and scanning probe nanolithography (SPN) has been demonstrated.
This is a preview of subscription content, access via your institution.
Buy single article
Instant access to the full article PDF.
Tax calculation will be finalised during checkout.
R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, Science 283, 661 (1999).
Y. Xia, J. A. Rogers, K. E. Paul, and G. M. Whitesides, Chem. Rev. 99, 1823 (1999).
L. A. Porter Jr, H. C. Choi, A. E. Ribbe, and J. M. Buriak, Nano Lett. 2, 1067 (2002).
L. A. Porter Jr, H. C. Choi, J. M. Schmeltzer, A. E. Ribbe, L. C. C. Elliott, and J. M. Buriak, Nano Lett. in press.
R. M. Penner, Acc. Chem. Res. 33, 78 (2000).
J. D. Aiken, and R. G. Finke, J. Mol. Cat. A. 145, 1 (1999).
K. Choi, and J. M. Buriak, Langmuir 16, 7737 (2000).
J. T. C. Wojtyk, M. Tomietto, R. Boukherroub, and D. D. M. Wayner, J. Am. Chem. Soc. 123, 1535 (2001).
F. Glockling, The Chemistry of Germanium, (Academic Press, 1969) p. 35.
Jillian M. Btiriak gratefully acknowledges support from NSF for grants CHE-9875150 and CHE-0110846 and a predoctoral fellowship to LAP. the Purdue Research Foundation (fellowships to HCC and JMS), the Indiana Instrumentation Institute (fellowship to LAP), and the Sloan Foundation. JMB is a Cottrell Teacher-Scholar of Research Corporation (2000-2002), and a Camille and Henry Dreyfus Teacher-Scholar (2002-2004). The Purdue Laboratory of Chemical Nanotechnology is acknowledged for technical support and expeit advice. Lindsay C. C. Elliott and Katie Jennings are thanked for help in preparing nanopaiticle films. Profs. Ralph G. Nuzzo and Fred E. Lytle are thanked for providing samples for microcontact printing. Dr. Richard T. Haasch is acknowledged for the acquisition of XPS data, carried out at the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U. S. Department of Energy under giant DEFG02-96-ER45439.
About this article
Cite this article
Poller, L.A., Choi, H.C., Schmeltzer, J.M. et al. New Pairs of Inks and Papers for Photolithography, Microcontact Printing, and Scanning Probe Nanolithography. MRS Online Proceedings Library 737, 32 (2002). https://doi.org/10.1557/PROC-737-F3.2