Abstract
Contactless photoconductivity measurements with the time-resolved microwave conductivity technique have been performed during the growth of hydrogenated amorphous silicon films. it has been shown that low substrate temperature and thin films lead to a larger electron decay rate and to an increased infrared absorption compared with high quality films. Addition of H2S to SiH4 during the glow discharge process leads to a worse fi1m quality which can be detected in-situ.
This is a preview of subscription content, access via your institution.
References
- [1]
R.A. Street, J.C. Knights, D.K. Biegelsen, Phys. Rev. B 18, 1880 (1978)
- [2]
G.D. Cody, B. Abeles, B. Brooks, P. Persans, L. Roxlo, A. Ruppert, C. Wronski, J. Non-Cryst. Solids 59, 60, 325 (1983)
- [3]
W. Pries, R.D. McLoed, H.C. Card, K.C. Kao, Appl. Phys. Lett. 45, 734 (1984)
- [4]
J. Tauc, Semiconductors and Semimetals vol. 21 B, Academic Press London, ed. by J.I. Pankove, p. 299 (1984)
- [5]
M. Kunst, A. Werne, J. Appl. Phys. 58, 2236 (1985)
- [6]
T. Tiedje, J.M. Cebulka, D.L. Mosel, B. Abeles, Phys. Rev. Lett. 46, 1425 (1981)
- [7]
A. Werner, M. Kunst, Appl. Phys. Lett. 46, 69 (1985)
- [8]
G.D. Cody, ref. 4, p. 11
Author information
Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Werner, A., Kunst, M. Influence of Preparation Conditions on Charge Carrier Dynamics in a-Si:H Determined by an In-Situ Technique. MRS Online Proceedings Library 70, 137–142 (1986). https://doi.org/10.1557/PROC-70-137
Published:
Issue Date: