Interference lithography for 3D photonic band gap crystal layer by layer fabrication

MRS Online Proceedings Library volume 692, Article number: 291 (2001) Cite this article

Abstract

We present fabrication of 3D photonic band gap woodpile crystals from photosensitive chalcogenide glass with the help of interference lithography and layer by layer construction. The alignment method is described, which is scalable to extremely small feature sizes required for photonic crystals in the visible region.

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Affiliations

  1. Electro-Optics Division, NRC Soreq, 81800, Yavne, Israel

    A. Feigel, Z. Kotler & B. Sfez

  2. Physics Dept, Ben-Gurion University, 84105, Beer-Sheva, Israel

    A. Arsh, M. Klebanov & V. Lyubin

Authors
  1. A. Feigel
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  2. Z. Kotler
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  3. B. Sfez
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  4. A. Arsh
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  5. M. Klebanov
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  6. V. Lyubin
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Corresponding author

Correspondence to A. Feigel.

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Feigel, A., Kotler, Z., Sfez, B. et al. Interference lithography for 3D photonic band gap crystal layer by layer fabrication. MRS Online Proceedings Library 692, 291 (2001). https://doi.org/10.1557/PROC-692-K2.9.1

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