MgO and Mg1-xTixO thin films were deposited by the electrostatic spray deposition method using Mg(tmhd)2 and Ti(OiPr)2(tmhd)2 as source materials and tetrahydrofuran and 1-octyl alcohol as solvents. The refractive index of the films shows a strong change from 1.73 for MgO to 2.39 for TiO2. The optical band gap energy values are 3.83 eV for TiO2 film and higher than 5.1 eV for films of Mg/(Mg+Ti) > 0.67. The discharge voltage and current increased with a content of Ti in Mg1-xTixO films. All these changes are closely associated with different Mg/(Mg+Ti) ratios of the films.
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T. Urade, T. Iemori, M. Osawa, N. Nakayama, IEEE Trans. Electron Devices 23, 313 (1976).
Y. Ushio, T. Banno, N. Matusa, Y. Saito, S. Baba, and A. Kinbara, Thin Solid Films 167(1-2), 299 (1988).
K. Yoshida, H. Uchiike, and M. Sawa, IEICE Trans. Electron. E82-C(10), 1798 (1999).
C. H. Chen, M. H. J. Emond, E. M. Kelder, B. Meester, and J. Schoonman, J. Aerosol Sci. 30(7), 959 (1999).
S. G. Kim, K. H. Choi, J. H. Eun, H. J. Kim, and C. S. Hwang, Thin Solid Films 377-378, 694 (2000).
J. Schoonman, Solid State Ionics 135, 5 (2000).
B. Su, M. Wei, and K. L. Choy, Mat. Lett. 47, 83 (2001).
C-H. Park, Y-K. Kim, B-E Park, W-G Lee, J-S. Cho, Mat. Sci. & Eng. B60, 149 (1999).
G. V. Samsonov, The Oxide handbook, 2und ed. (IFI/Plenum data company, New York, 1982), p. 228.
J. I. Pankove, Optical processes in semiconductors, (Prentice-Hall, New Jersey, 1971), p. 36.
G. Timmer and G. Borstel, Phys. Rev. B43(6), 5098 (1991).
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Kim, S.G., Kim, YK., Park, CH. et al. Investigation of MgO and Mg1-xTixO thin Films by Electrostatic Spray Deposition Method for a Protective Layer of AC-Plasma Display Panel. MRS Online Proceedings Library 685, 5281 (2001). https://doi.org/10.1557/PROC-685-D5.28.1