Nanostructures from POSS-Grafted Block Copolymer Precursors


A new method to prepare novel nanocomposites has been studied in which a polyhedral oligomeric silsesquioxane (POSS) monomer is grafted to a polyisoprene- block-polystyrene copolymer to yield an inorganic-organic hybrid copolymer (POSS-g-PI- block-PS). PS- block-PI copolymers (SI) were synthesized via anionic polymerization in tetrahydrofuran (THF) as solvent. The polyisoprene block of the SI diblock copolymers in this study featured a very high vinyl group fraction (65 mole % of 3, 4- addition and 35 mole % of 1, 2-addition) available to react with hydride-substituted POSS (isobutyldimethyl silane-POSS) to form a grafted block copolymer. Due to the immiscibility between POSS-grafted PI block and PS block, the grafted block copolymer developed a microdomain structure. The volume fraction of PS block in the grafted block copolymer was varied in the range of 0.45 to 0.37 in order to yield cylindrical PS microdomains in the matrix of POSS-grafted PI. After exposure to an oxygen plasma, it is expected that preferential erosion of the grafted block copolymer will occur for the organic potion (PS microdomains) thus leaving a well-defined nanoporous surface structure for nonlithographic functionalization of coated substrates.

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Correspondence to Seung B. Chun.

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Chun, S.B., Mather, P.T. Nanostructures from POSS-Grafted Block Copolymer Precursors. MRS Online Proceedings Library 661, KK10.8 (2000).

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