Abstract
Growth front scaling aspects are investigated for PPV-type oligomer thin films vapor- deposited onto silicon substrates at room temperature. For film thickness d~15-300 nm, commonly used in optoelectronic devices, correlation function measurement by atomic force microscopy yields roughness exponents in the range H=0.45±0.04, and an rms roughness amplitude which evolves with film thickness as a power law σ dβ with β=0.28±0.05. The non-Gaussian height distribution and the measured scaling exponents (H and β) suggest a roughening mechanism close to that described by the Kardar-Parisi-Zhang scenario.
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Tsamouras, D., Palasantzas, G., De Hosson, J.T.M. et al. Growth Front Roughening of Room Temperature Deposited Oligomer Thin Films. MRS Online Proceedings Library 648, 620 (2000). https://doi.org/10.1557/PROC-648-P6.20
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DOI: https://doi.org/10.1557/PROC-648-P6.20