A High-Temperature STM-Study of Iron Silicide Formation on High Index Silicon Surfaces

Abstract

The nucleation and initial growth of iron silicide on Si(113), Si(5 5 12) and Si(114) is studied using high temperature STM. During MBE and gas source deposition (precursor Fe(CO)5 STM-“movies” at temperatures up to 600°C directly show the kinetics of silicide formation on the surface. A complete 2D-wetting layer is formed on all vicinal surfaces for temperatures below 510°C. A chain-like silicide structure with a mixture of different periodicities (4×n), with n ranging from 2-6, is found. Above one monolayer growth proceeds with anisotropic 3D-silicide-islands. The wetting layer was found to be only metastable at lower growth temperature. At temperatures above 510°C the 2D-silicide layer does not wet the substrate anymore. In the equilibrium growth mode, 3D-islands directly grow on the bare Si-substrate. The anisotropy of the 3D-islands is extremly temperature dependent resulting in an aspect ratio up to 50 at 600°C. Especially on Si(114) a one-dimensionally nanostructured silicide layer can be grown in this way. A lateral spreading of the 3D-islands forming an interconnected silicide layer is achieved on Si(113) by a stochiometric codeposition of Fe and Si.

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References

  1. 1.

    S. Song, M. Jong, S.G.J. Mochrie, G.B. Stephenson, S.T. Milner, Surf. Sci. 372, 37 (1996).

    Article  Google Scholar 

  2. 2.

    A.A. Baski, S.C. Erwin, L.J. Whitman, Surf. Sci. 392, 69 (1997).

    CAS  Article  Google Scholar 

  3. 3.

    J. Dabrowski, H.J. Müssig, G. Wolff, Phys. Rev. Lett. 73, 1660 (1994).

    CAS  Article  Google Scholar 

  4. 4.

    V. Dorna, Z. Wang, U. Köhler, Surf. Sci. Lett. 401, L375 (1998).

    CAS  Article  Google Scholar 

  5. 5.

    F.-J. Meyer zu Heringdorf, H. Goldbach, H.-L. Günter, M. Horn-von Hoegen, V. Dorna, U. Köhler, M. Henzler, Surf. Sci. 458, 147 (2000).

    Article  Google Scholar 

  6. 6.

    M. Kneppe, V. Dorna, P. Kohstall, E. Kot, U. Köhler, Surf. Sci. 454-456, 802 (2000).

    CAS  Article  Google Scholar 

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Correspondence to Martin Kneppe.

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Kneppe, M., Kot, E., Dorna, V. et al. A High-Temperature STM-Study of Iron Silicide Formation on High Index Silicon Surfaces. MRS Online Proceedings Library 648, 102 (2000). https://doi.org/10.1557/PROC-648-P10.2

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