Abstract
Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.
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References
- 1
T.S. Lewkebandara, C.H. Winter, Chemtracts- Inorg. Chem. p. 271 (1994).
- 2
M. Suzuki, T. Ami, Mater. Sci. Eng. B 41, p. 166 (1996).
- 3
T. Inoue, Y. Yamamoto, M. Satoh, A. Ide, S. Katsumata, Thin Solid Films 282, p. 24 (1996).
- 4
X.D. Wu, R.C. Dye, R.E. Muenchausen, S.R. Foltyn, M. Maley, A.D. Rollett, A.R. Garcia, N.S. Nogar, Appl. Phys. Lett. 58, p. 2165 (1991).
- 5
J.L. Macmanus-Driscoll, Adv. Mater. 9, p. 457 (1997).
- 6
X.Z Wang, B.W. Wessels, Appl. Phys. Lett. 67, p. 518 (1995).
- 7
P.D. Rack, A. Naman, P.H. Holloway, S.S. Sun, R.T. Tuenge, MRS Bull. 21, p. 49 (1996).
- 8
C.R. Ronda, T. Justel, H. Nikol, J. Alloys Cornpd.. 277, p. 669 (1998).
- 9
J. McAleese, J.C. Plakatouras, B.C.H. Steele, Thin Solid Films 280, p. 152 (1996).
- 10
T. Kodas, M. Hampden-Smith, The Chemistry Of Metal CVD, VCH, Weinheim, 1994.
- 11
K.-H. Dahmen, T. Gerfin, Progress in Crystal Growth and Characterization of Materials 27, p. 117 (1993).
- 12
T.J. Marks, Pure and Appl. Chem. 67, p. 313 (1995).
- 13
J.A. Belot, D.A. Neumayer, C.J. Reedy, D.B. Studebaker, B.J. Hinds, C.L. Stern, T.J. Marks, Chem. Mater. (Chem. Vap. Dep.) 9, p. 1638 (1997).
- 14
J.R. Babcock, D.D. Benson, A. Wang, N.L. Edleman, J.A. Belot, M.V. Metz, T.J. Marks, Adv. Mater. (Chem. Vap. Dep.), in press.
- 15
J. Nukeaw, J. Tanagisawa, N. Matsubara, Y. Fujiwara, Y. Takeda, Appl. Phys. Lett. 70, p. 84 (1997).
- 16
M. Becht, T. Gerfin, K.H. Dahmen, Chem. Mater. 5, p. 137(1993).
- 17
I.E. Graboy, N.V. Markov, V.V. Maleev, A.R. Kaul, S.N. Polyakov, V.L. Svetchnikov, H.W. Zandbergen, K.H. Dahmen, J. Alloys Compd. 251, p. 318 (1997).
- 18
R. Hiskes, S.A. DiCarolis, R.D. Jacowitz, Z. Lu, R.S. Fiegelson, R.K. Ronte, J.L. Young, J. Cryst. Growth 128, p. 781 (1993).
- 19
M. Becht, F. Wang, J.G. Wen, T. Morishita, J. Cryst. Growth 170, p. 799 (1997).
- 20
Z. Lu, R. Hiskes, S.A. DiCarolis, A. Nel, R.K. Ronte, R.S. Fiegelson, J. Cryst. Growth 156, p. 227 (1995).
- 21
S. Liang, C.S. Chern, Z.Q. Shi, P. Lu. Y. Lu, B.H. Kear, J. Cryst. Growth 151, p. 359(1995).
- 22
D. Chadwick, J. McAleese, K. Senkiw, B.C.H. Steele, Appl. Surf. Sci. 99, p. 417 (1996).
- 23
J.A. Belot, A. Wang, R.J. McNeely, L. Liable-Sands, A.L. Rheingold, T.J. Marks, Adv. Mater. (Chem. Vap. Dep.) 5, p. 65 (1999).
- 24
D.L. Schulz, B.J. Hinds, D.A. Neumayer, C.L. Stern, T.J. Marks, Chem. Mater. 5, p. 1605 (1993).
- 25
A. Wang, J.A. Belot, T.J. Marks, P.R. Markworth, R.P.H. Chang, M.P. Chudzik, C.R. Kannewurf, Physica C 320, p. 154 (1999).
- 26
D.C. Bradley, J.S. Ghorta, F.A. Hart, J. Chem. Soc, Dalton Trans., p. 1021 (1973).
- 27
The applicability of this analysis is explained in B.J. Hinds, R.J. McNeely, D.B. Studebaker, T.J. Marks, T.P. Hogan, J.L. Schindler, C.R. Kannewurf, X.F. Zhang, D.J. Miller, J. Mater. Res. 12, p. 1214 (1997).
- 28
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Edleman, N.L., Belot, J.A., Babcock, J.R. et al. Volatile, Fluorine-Free β-Ketoiminate Precursors for MOCVD Growth of Lanthanide Oxide Thin Films. MRS Online Proceedings Library 623, 371 (2000). https://doi.org/10.1557/PROC-623-371
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