Electronic Structures of Shallow Acceptors Confined in Si/SiGe Quantum Well Structures

Abstract

Energy levels of the shallow acceptor states have been calculated for center-doped Si/Si1−xGex/Si quantum wells (QWs). The impurity states were calculated using an effective-mass theory that accounts for valence-band mixing as well as the mismatch of band parameters and dielectric constants between well and barrier materials. Acceptor binding energies and splitting between the acceptor 1S3/27) and 1S3/26) ground states were studied at various Ge concentrations and well widths. The results are discussed in comparison with the recent experimental data from the lateral transport measurements in boron-doped Si/SiGe quantum wells.

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Correspondence to Q. X. Zhao.

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Zhao, Q.X., Willander, M. Electronic Structures of Shallow Acceptors Confined in Si/SiGe Quantum Well Structures. MRS Online Proceedings Library 607, 273 (1999). https://doi.org/10.1557/PROC-607-273

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