Abstract
Growth of GaN and AlxGa1−xN thin films on 6H-SiC(0001) and Si(111) substrates with low densities of defects using the PENDEO™ process and the characterization of the resulting materials are reported. The application of a mask on the GaN seed structures hinders the vertical propagation of threading dislocations of the seed material during regrowth, but introduces a misregistry in the overgrowing material resulting in low quality crystal growth. This misregistry has been eliminated due to advanced processing and the exclusion of the masking layer. The new generation of samples do not show any misregistry, as shown by transmission electron microscopy.
Similar content being viewed by others
References
T. Gehrke, K. J. Linthicum, D.B. Thomson, P. Rajagopal, A. D. Batchelor and R. F. Davis, MRS Internet J. Nitride Semicond. Res 4S1, G3.2 (1999)
K. J. Linthicum, T. Gehrke, D.B. Thomson, K.M. Tracy, E.P. Carlson, T.P. Smith, T.S. Smith, T.S. Zheleva, C.A. Zorman, M. Mehregany, and R.F. Davis, MRS Internet J. Nitride Semicond. Res4S1, G4.9 (1999)
K. J. Linthicum, T. Gehrke, D.B. Thomson, E.P. Carlson, P. Rajagopal, T. Smith, and R.F. Davis, Appl. Phys. Lett., Vol.75, No.2, p.196 (1999)
D.B. Thomson, T. Gehrke, K. J. Linthicum, P. Rajagopal, P. Hartlieb, T. S. Zheleva and R. F. Davis, MRS Internet J. Nitride Semicond. Res 4S1, G3.37 (1999)
K.J. Linthicum, T. Gehrke, D. Thomson, C. Ronning, E.P. Carlson, C.A. Zorman, M. Mehregany, and R.F. Davis, MRS, Spring Meeting 1999, Symp. Y, 6.7
T. Gehrke, K. J. Linthicum, E. Preble, P. Rajagopal, C. Ronning, C. Zorman, M. Mehregany, R. F. Davis, submitted for publication in J. of Electr. Mater.
O.H. Nam, T.S. Zheleva, M.D. Bremser, D.B. Thomson, R.F. Davis, Mat. Res. Soc. Symp. Proc., Vol.482, p.301 (1998)
Z. Liliental-Weber, M. Benamara, W. Swider, J. Washburn, J. Park, P.A. Grudowski, C.J. Eiting, R.D. Dupuis, MRS Internet J. Nitride Semicond. Res. 4S1, G4.6 (1999)
A. Sakai, H. Suankawa, A. Usui, Appl. Phys. Lett., Vol.73, No.4, (1998) p.481
H. Marchand, N. Zhang, L. Zhao, Y. Golan, S.J. Rosner, G. Girolami, P.T. Fini, J.P. Ibbetson, S. Keller, S.P. DenBaars, J.S. Speck, U.K. Mishra, MRS Internet J. Nitride Semicond. Res. 4, 2 (1999)
T. Gehrke, K.J. Linthicum, P. Rajagopal, E.A. Preble, E.P. Carlson, B.M. Robin, R.F. Davis, Int. Conf. on SiC and Related Materials (ICSCRM), Raleigh, NC, paper #269 (1999)
P. Fini, H. Marchand, J.B. Ibbetson, B. Moran, L. Zhao, S.P. DenBaars, J.S. Speck, U.K. Mishra, MRS, Spring Meeting 1999, Symp. Y, 6.6
Author information
Authors and Affiliations
Corresponding author
Additional information
PENDEOEPITAXY and PENDEO are trademarks of Nitronex Corporation, Raleigh, NC 27606
Rights and permissions
About this article
Cite this article
Gehrke, T., Linthicum, K.J., Rajagopal, P. et al. Advanced Pendeoepitaxy™ of GaN and AlxGa1−xN Thin Films on SiC(0001) and Si(111) Substrates via Metalorganic Chemical Vapor Deposition. MRS Online Proceedings Library 595, 24 (1999). https://doi.org/10.1557/PROC-595-F99W2.4
Published:
DOI: https://doi.org/10.1557/PROC-595-F99W2.4