Effects of Composition on the Microstructures and Optical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Abstract

Hydrogenated amorphous silicon carbide films (a -SiC:H) were prepared from CH4, SiH4, and Ar mixtures by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition (ECR PCVD). The deposition of the thin films was proceeded with the following optimized conditions; microwave power: 900W, Ar flux: 90sccm, and total flux: 113.4 sccm. The substrate temperature was around 100~120°C during deposition. For comparisons, the relative flux ratio of methane to silane was varied to produce thin films of different compositions to investigate the relationships between the associated compositions of films and their corresponding microstructures and optical properties. Moreover, both film’s microstructures and their optical properties were analyzed to find out as to how they are interrelated. Furthermore, the surface morphology and amorphous microstructures were confirmed by Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM), respectively. And, x-ray Photoelectron Spectroscopy (XPS) was employed to study the relative atomic ratio of C to Si along with the bonding conditions in the thin films. Finally, the Hydrogen concentration and the amounts of C-H and Si-H bonds were determined by Fourier transform infrared spectroscopy(FTIR), while the optical properties were measured by optical spectrophotometer.

This is a preview of subscription content, access via your institution.

References

  1. 1.

    D.A. Anderson and W.E. Spear, Philos. Mag. 35, 1 (1977).

    CAS  Article  Google Scholar 

  2. 2.

    A. Yamada, J. Kenne, M. Konagai, and K. Takahashi, Appl. Phys. Lett. 46, 272 (1985).

    CAS  Article  Google Scholar 

  3. 3.

    S.C. Jwo and C.Y. Chang, IEEE Elect. Device Lett. 7, 689 (1986).

    Article  Google Scholar 

  4. 4.

    J. B. Kortright and D. L. Windt, Appl. Optics. 27, 2841 (1988).

    CAS  Article  Google Scholar 

  5. 5.

    S. C. Jwo, M. T. Wu, Y. K. Fang, Y.W. Chen, J. W. Hong, and C.Y. Chang, IEEE Trans. on Elect. Device. 35, 1279 (1988).

    Article  Google Scholar 

  6. 6.

    F. Alvarez, H. L. Fragnito, I. Chambouleyron, J. Appl. Phys. 63, 244 (1988).

    CAS  Article  Google Scholar 

  7. 7.

    M. Hiramoto, K. Yoshimura, T. Miyao, and M. Yokoyama, Appl. Phys. Lett. 58, 114 (1991).

    Google Scholar 

  8. 8.

    M. Hiramoto, K. Yoshimura, and M. Yokoyama, Appl. Phys. Lett. 60, 110 (1992).

    Google Scholar 

  9. 9.

    K. Akiyama, A. Takimoto, and H. Ogawa, Appl. Optics. 32, 6493 (1993).

    CAS  Article  Google Scholar 

  10. 10.

    A.R. Shimkunas, P.E. Mauger, L.P. Bourget, R.S. Post, L. Smith, R.F. Davis, G.M. Wells, F. Cerrina, and R.B. Mcintosh, J. Vac. Sci. Technol. B. 9, 3258 (1991).

    CAS  Article  Google Scholar 

  11. 11.

    R.S. Sussmann and R. Ogden, Phil. Mag. B. 44, 137 (1981).

    CAS  Article  Google Scholar 

  12. 12.

    S.E. Hicks, A.G. Fitzgerald and S.H. Baker, Phil. Mag. B. 62, 193 (1990).

    CAS  Article  Google Scholar 

  13. 13.

    M.A. Petrich, K.K. Gleason, and J.A. Reimer, Phys. Rev. B. 36, 9722(1987).

    CAS  Article  Google Scholar 

  14. 14.

    WY. Lee, J. Appl. Phys. 51, 3365 (1980).

    CAS  Article  Google Scholar 

  15. 15.

    W.A. Nevin, H. Yamagishi, M. Yamaguchi, and Y. Tawada, Nature 368, 529 (1994).

    CAS  Article  Google Scholar 

  16. 16.

    G.H. Chen, F.Q. Zhang and X.X. Xu, J. Non-Cryst. Solids. 59&60, 577–580 (1983).

    Google Scholar 

  17. 17.

    D. Kruangam, T. Toyama, Y. Hattori, M. Deguchi, H. Okamoto, and Y. Hamakawa, J. NonCryst. Solids. 97&98, 293–296 (1987).

    Article  Google Scholar 

  18. 18.

    M.J. Loboda, Amorphous and Crystalline Silicon Carbide IV, edited by C.Y. Yang, M.M. Rahman, and G.L. Harris (Springer-Verlang, Berlin, 1992), p. 271

  19. 19.

    W. Z. Chou, MS thesis, National Tsing Hua University, 1996.

  20. 20.

    E. Echchamikh, M. Azizan, E.L. Ameziane, A. Bennouna, M. Brunel, and T.T.A. Nguyen, Solar Energy Material and Solar Cells. 31, 187 (1993).

    CAS  Article  Google Scholar 

  21. 21.

    R. Arce, R.R. Koropecki, and R.H. Buitrago, J. Appl. Phys. 66, 4544 (1989).

    CAS  Article  Google Scholar 

  22. 22.

    B.D. Cullity, Elements of x-ray Diffraction, 2nd. (Addison-Wesley publisher), p. 506.

  23. 23.

    RC Handbook of Chemistry and Physics, 75th ed. edited by D.R. Lide (CRC Press, London, 1994).

    Google Scholar 

  24. 24.

    J. Tauc, Optical Properties of Solids, edited by F. Abales (North-Holland, Amsterdan, 1972), p. 279.

  25. 25.

    N. Mott and Davis, Electronic Processes in Non-crystalline Materials, 2nd ed. (Clarendon Press, Oxford, 1979).

    Google Scholar 

  26. 26.

    J. Robertson, Phil. Mag. B. 66, 615 (1992).

    CAS  Article  Google Scholar 

  27. 27.

    L. H. Chou and H. W. Wang, J. Appl. Phys. 74, 4673, (1993).

    CAS  Article  Google Scholar 

Download references

Author information

Affiliations

Authors

Corresponding author

Correspondence to Lih-Hsiung Chan.

Rights and permissions

Reprints and Permissions

About this article

Cite this article

Chan, LH., Chou, WZ. & Chou, LH. Effects of Composition on the Microstructures and Optical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition. MRS Online Proceedings Library 593, 535–540 (1999). https://doi.org/10.1557/PROC-593-535

Download citation