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Oxidation Modelling for SiC

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Abstract

A simple mechanistic model of the oxidation of SiC is presented and analysed using Monte- Carlo simulation techniques. The model explains the observed anisotropic oxidation rate of SiC in terms of the effect of weakening/strengthening of Si-C bonds arising from the ongoing incorporation of highly electronegative oxygen atoms into the crystal lattice. The extraction of key process metrics (such as oxide thickness, interface roughness and oxide defect density) from the Monte-Carlo simulations is discussed.

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Authors and Affiliations

  1. Dept. Of Electrical and Electronic Engineering, The University of Newcastle upon Tyne, Newcastle, UK, NEI 7RU

    N. G. Wright, C. M. Johnson & A. G. O’neill

Authors
  1. N. G. Wright
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  2. C. M. Johnson
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  3. A. G. O’neill
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Correspondence to N. G. Wright.

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Wright, N.G., Johnson, C.M. & O’neill, A.G. Oxidation Modelling for SiC. MRS Online Proceedings Library 572, 135 (1999). https://doi.org/10.1557/PROC-572-135

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  • DOI: https://doi.org/10.1557/PROC-572-135

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