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Field Emission from Carbon Films Deposited by VHF CVD on Different Substrates

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Abstract

As previously demonstrated, non-diamond carbon (NDC) films deposited at low temperatures 200-300 °C on silicon tips reduced the threshold of field emission. In this paper we will present the results of the study of field emission from flat NDC films prepared by VHF CVD. Emission measurements were performed in a diode configuration at approximately 10-10 Torr. NDC films were deposited on ceramic and on c-Si substrates sputter coated with layers of Ti, Cu, Ni and Pt. The back contact material influences the emission characteristics but not as a direct correlation to work function. A model of field emission from metal-NDC film structures will be discussed.

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Authors and Affiliations

  1. A.F.Ioffe Phys-Techn. Inst., S.-Petersburg, 194021, Russia

    A. I. Kosarev, A. S. Abramov, A. J. Vinogradov & M. V. Shutov

  2. Sandia National Laboratories, USA

    T. E. Felter

  3. Lawrence Livermore National Laboratory, CA, 94550, USA

    T. E. Felter

  4. Technical University, S.-Petersburg, 194251, Russia

    A. N. Andronov & S. V. Robozerov

Authors
  1. A. I. Kosarev
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  2. A. S. Abramov
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  3. A. J. Vinogradov
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  4. M. V. Shutov
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  5. T. E. Felter
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  6. A. N. Andronov
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  7. S. V. Robozerov
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Kosarev, A.I., Abramov, A.S., Vinogradov, A.J. et al. Field Emission from Carbon Films Deposited by VHF CVD on Different Substrates. MRS Online Proceedings Library 558, 595–599 (1999). https://doi.org/10.1557/PROC-558-595

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  • DOI: https://doi.org/10.1557/PROC-558-595

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