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Cubic InGaN Grown by MOCVD

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We report on the growth of high-quality cubic phase InGaN on GaAs by MOCVD. The cubic InGaN layers are grown on cubic GaN buffer layers on GaAs (001) substrates. The surface morphology of the films are mirror-like. The cubic nature of the InGaN films is obtained by X-ray diffraction (XRD) measurements. The InGaN layers show strong photoluminescence (PL) at room temperature. Neither emission peak from wurtzite GaN nor yellow luminescence is observed in our films. The highest In content as determined by XRD is about 17% with an PL emission wavelength of 450 nm. The FWHM of the cubic InGaN PL peak are 153 meV and 216 meV for 427 nm and 450 nm emissions, respectively. It is found that the In compositions determined from XRD are not in agreement with those estimated from PL measurements. The reasons for this disagreement are discussed.

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Authors and Affiliations

  1. National Research Center for Opto-electronic Technology, Institute of Semiconductors CAS, Beijing, 100083, China

    J. B. Li, Hui Yang, L. X. Zheng, D. P. Xu & Y. T. Wang

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  1. J. B. Li
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  2. Hui Yang
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  3. L. X. Zheng
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  4. D. P. Xu
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  5. Y. T. Wang
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Li, J.B., Yang, H., Zheng, L.X. et al. Cubic InGaN Grown by MOCVD. MRS Online Proceedings Library 537, 325 (1998). https://doi.org/10.1557/PROC-537-G3.25

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  • DOI: https://doi.org/10.1557/PROC-537-G3.25

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