Comparison of Novel Chlorine, Bromine and Iodine Plasma Chemistries for Anisotropic Trench Etching In GaN, InN and Ain

MRS Online Proceedings Library volume 512, pages501–506(1998)Cite this article

Abstract

Anisotropic pattern transfer has been performed for GaN, InN and AIN in Cl2/Ar, BI3/Ar and BBr3/Ar Inductively Coupled Plasmas(ICP). Controlled etch rates in the range of 500–1500Å·min−1 are obtained for III-nitride materials in Cl2/Ar chemistry. Etch selectivities of 100:1 were achieved for InN over both GaN and AIN in the BI3 mixtures, while for BBr3 discharges values of 100:1 for InN over AIN and 25:1 for InN over GaN were measured.

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Affiliations

  1. Department of Materials Science and Engineering, University of Florida, Gainesville, FL, USA

    Hyun Cho, T. Maeda, J. D. MacKenzie, S. M. Donovan, C. R. Abemathy & S. J. Pearton

  2. Sandia National Laboratories, Albuquerque, NM, USA

    R. J. Shul & J. Han

  3. Department of Chemical Engineering, University of Florida, Gainesville, FL, USA

    F. Ren

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  1. Hyun Cho
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  2. T. Maeda
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  3. J. D. MacKenzie
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  4. S. M. Donovan
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  5. C. R. Abemathy
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  6. S. J. Pearton
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  7. R. J. Shul
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  8. J. Han
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  9. F. Ren
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Correspondence to Hyun Cho.

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Cho, H., Maeda, T., MacKenzie, J.D. et al. Comparison of Novel Chlorine, Bromine and Iodine Plasma Chemistries for Anisotropic Trench Etching In GaN, InN and Ain. MRS Online Proceedings Library 512, 501–506 (1998). https://doi.org/10.1557/PROC-512-501

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