Nitridation of Sapphire Substrate Using Remote Plasma Enhanced-Ultrahigh Vacuum Chemical Vapor Deposition At Low Temperature

Jong-Six Paek; Kyoung-Kook Kim; Ji-Myon Lee; Dong-Jun Kim; Hyo-Gun Kim; Seong-Ju Park

doi:10.1557/PROC-482-81

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Last updated: Sat, 17 Apr 2021 20:52:35 Z

Nitridation of Sapphire Substrate Using Remote Plasma Enhanced-Ultrahigh Vacuum Chemical Vapor Deposition At Low Temperature

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