Enhanced Photoyield with Decreasing Film Thickness on Metal-Semiconductor Structures

Abstract

Experimental results of the internal quantum yield Yi associated with the internal photoemission on Au/n-Si structures are presented. The samples were prepared on Si(100) and Si(111) substrates with photoemitter layer thicknesses ranging from 5 nm to 50 nm. The Yi was measured at temperatures between 165 K and 300 K with the photoexciting energy varying from 0.72 eV to 1.07 eV. It was found that the Yi increases with decreasing Au layer thickness with a strong enhancement (40 times) in regard to the conventional Fowler theory. This experimental result is in good agreement with model calculations taking account of hot carrier scattering in the photoemitter layer. Barrier energies are larger than deduced from the Fowler plot.

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Correspondence to V. Hoffmann.

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Hoffmann, V., Brauer, M. & Schmidt, M. Enhanced Photoyield with Decreasing Film Thickness on Metal-Semiconductor Structures. MRS Online Proceedings Library 448, 413–418 (1996). https://doi.org/10.1557/PROC-448-413

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