The Gas Field Ion Source, GFIS, promises a 109A/(cm2 str) brightness, small beam sizes, and inert gas ion species. If this performance could be demonstrated on a commercial system, the GFIS might replace the liquid metal ion source as the standard source for FIB applications. Recent work at the Max-Planck-Institut für Kernphysik (MPI-K) in Heidelberg, Germany has shown that a GFIS with a ‘Super Tipped’ emitter can be reliably fabricated and can be run with stable helium beam current for more than 200 hours. However, this GFIS source must operate in a bakable UHV chamber, at cryogenic temperatures, and at high voltages with low vibration. A GFIS is now being integrated with high resolution ion optics and a vacuum chamber designed for studying GFIS image quality and ion induced chemistry.
This is a preview of subscription content, access via your institution.
Buy single article
Instant access to the full article PDF.
Tax calculation will be finalised during checkout.
R. Gomer, Field Emission and Field Ionization, Harvard Monographs in Applied Science No. 9, Harvard University Press, MA (1961)
P.R. Schwoebel, J. Appl.Phys. 64 (5), p. 2359 (1988)
K. Jousten, K. Bohringer, R. Borret, and S. Kalbitzer, Ultramicroscopy, 26 p. 301 (1988)
About this article
Cite this article
Thompson, W., Armstrong, A., Etchin, S. et al. The Gas Field Ion Source for Finely Focused Ion Beam Systems. MRS Online Proceedings Library 396, 687 (1995). https://doi.org/10.1557/PROC-396-687