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Characterization of Multilayer Thin Film Structures for Gas Sensor Applications

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Abstract

A nicrofabricated silicon-based chemical gas sensor with a discontinuous film of Pt / TiOx, as the active sensing component has been characterized by atomic force microscopy, environmental scanning electron microscopy, and transmission electron microscopy. A study of the device’s multilayer structure and of the thin sensing film is undertaken to understand and control the sensing properties of the metal / semiconducting materials. The purpose of this research is to advance the understanding of the conduction mechanism and provide a basis for optimizing the sensing properties and microstructure of the sensing device.

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References

  1. C.L. Johnson, J. W. Schwank, and K. D. Wise, Sensors and Actuators B, 20, 55–62 (1994).

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Authors and Affiliations

  1. Department of Chemical Engineering, University of Michigan, Ann Arbor, 48109, MI, USA

    M. Dibattista, S. V. Patel, J. L. Gland & J. W. Schwank

  2. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, 48109, MI, USA

    K. D. Wise

  3. Department of Electron Microbeam Analysis Lab, University of Michigan, Ann Arbor, 48109, MI, USA

    J. F. Mansfield

  4. Department of Chemistry, University of Michigan, Ann Arbor, 48109, MI, USA

    J. L. Gland

Authors
  1. M. Dibattista
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  2. S. V. Patel
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  3. K. D. Wise
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  4. J. L. Gland
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  5. J. F. Mansfield
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  6. J. W. Schwank
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Dibattista, M., Patel, S.V., Wise, K.D. et al. Characterization of Multilayer Thin Film Structures for Gas Sensor Applications. MRS Online Proceedings Library 382, 477 (1995). https://doi.org/10.1557/PROC-382-477

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  • DOI: https://doi.org/10.1557/PROC-382-477

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