The Modeling Routes for the Chemical Vapor Deposition Process

Abstract

The purpose of this article is to present the modeling routes for the chemical vapor deposition process with a special emphasis to mass transport models with near local thermochemical equilibrium imposed in the gas-phase and at the deposition surface. The theoretical problems arising from the linking of the two selected approaches, thermodynamics and mass transport, are shown and a solution procedure is proposed. As an illustration, selected results of thermodynamic and mass transport analysis and of the coupled approach showed that, for the deposition of Sii-xGex solid solution at 1300 K (system Si-Ge-Cl-H-Ar), the thermodynamic heterogeneous stability of the reactive gases and the thermal diffusion led to the germanium depletion of the deposit.

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References

  1. [1]

    K.F. Jensen, in Microelectronics Processing: Chemical Engineering Aspects, edited by D.W. Hess and K.F. Jensen, Advances in Chemistry Series 221 (American Chemical Society, Washington DC, 1989) pp. 199–263.

  2. [2]

    S.A. Gokoglu, in Chemical Vapor Deposition of Refractory Metals and Ceramics II, edited by T.M. Besmann, B.M. Gallois and J.W. Warren (Materials Research Society Symp. 250, Pittsburgh, PA, 1992) pp 17–28.

  3. [3]

    C.R. Kleijn, C. Werner, Modeling of Chemical Vapor Deposition of Tungsten Films (Birkhaüser, Verlag, 1993).

    Google Scholar 

  4. [4]

    P. Ho, M.E. Coltrin, J.S. Binkley, C.F. Melius, J. Phys. Chem., 89, 4647 (1985).

    CAS  Article  Google Scholar 

  5. [5]

    K.E. Spear, R.R. Dirkx, High Temp. Sci., 27, 107 (1990).

    Google Scholar 

  6. [6]

    M. Pons, C. Bernard, R. Madar, Surf. Coat. Technol., 61, 274 (1993).

    CAS  Article  Google Scholar 

  7. [7]

    M.D. Allendorf, J. Electrochem. Soc., 140 (3), 747 (1993).

    CAS  Article  Google Scholar 

  8. [8]

    D. E. Rosner, J. Collins, in Chemical Vapor Deposition of Refractory Metals and Ceramics, edited by T.M. Besmann and B.M. Gallois (Materials Research Society Symp. 168, Pittsburgh, PA, 1990) pp 43–48.

  9. [9]

    S.A. Gokoglu, J. Electrochem. Soc., 135, 1562 (1988).

    CAS  Article  Google Scholar 

  10. [10]

    D. Zhu, Y. Sahai, Metall. Trans., 322, 309 (1991).

    Article  Google Scholar 

  11. [11]

    M. Pons, J.N. Barbier, C. Bernard, R. Madar, Appl. Surf. Sci., 73, 71 (1993).

    CAS  Article  Google Scholar 

  12. [12]

    M.E. Coltrin, R.J. Kee, F.M. Rupley, Inst. J. Chem. Kin., 23, 1111 (1991).

    CAS  Article  Google Scholar 

  13. [13]

    M.E. Coltrin, R.J. Kee, J.A. Miller, J. Electrochem. Soc., 133, 1206 (1986).

    CAS  Article  Google Scholar 

  14. [14]

    M.E. Coltrin, R.J. Kee, G.H. Evans, J. Electrochem. Soc., 136, 819 (1989).

    Article  Google Scholar 

  15. [15]

    J.P. Couderc, P. Duverneuil, J. Electrochem. Soc., 139, 296 (1992).

    Article  Google Scholar 

  16. [16]

    M.D. Allendorf, R.J. Kee, J. Electrochem. Soc., 138 (3), 1841 (1991).

    Article  Google Scholar 

  17. [17]

    S.A. Gokoglu, M.A. Kuczmarski, in CVD-XII International Symposium on Chemical Vapor Deposition, edited by K.F. Jensen and G.W. Cullen, Proceeding Volume 93–2 (The Electrochemical Society, Pennington, NJ, 1993) pp. 392–400.

    Google Scholar 

  18. [18]

    E. Blanquet, S.A. Gokoglu, in ref. 17, 103–109.

  19. [19]

    T.J. Mountziaris, K.F. Jensen, J. Crystal Growth, 138, 2426 (1991).

    CAS  Google Scholar 

  20. [20]

    M. Frenklach, H. Wang, Phys. Rev., B 43, 1520 (1991).

    CAS  Article  Google Scholar 

  21. [21]

    J.N. Barbier, C. Bernard, Proceedings of the 15 th Calphad Meeting, edited by B.L. Kaufman, Calphad (1986) 206.

  22. [22]

    SGTE databank, Scientific Group Thermodata Europe, BP 66, 38402 Saint-Martin d'Hères, France.

  23. [23]

    H. Rouch, PhD Thesis, Institut National Polytechnique de Grenoble, 1994.

  24. [24]

    C. Bergman, R. Chastel, R. Castanet, J. Phase Equi., 13, 2 (1992).

    Article  Google Scholar 

  25. [25]

    M. Pons, A. Benezech, P. Huguet, R. Gaufres, Ph. Diez, J. CVD (in press).

  26. [26]

    R.B. Bird, W.E. Stewart, E.N. Lightfoot, Transport Phenomena, (Wiley, NY, 1960).

    Google Scholar 

  27. [27]

    Flux Expert, DT2I, Chemin des Prèles, 38240 Meylan, France, 1994.

Download references

Acknowledgments

This work was supported by the Centre National de la Recherche Scientifique. The authors acknowledge the referee for valuable recommendations

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Correspondence to M. Pons.

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Pons, M., Bernard, C., Rouch, H. et al. The Modeling Routes for the Chemical Vapor Deposition Process. MRS Online Proceedings Library 363, 15–26 (1994). https://doi.org/10.1557/PROC-363-15

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