Abstract
Amorphous alumina films were deposited by metal-organic chemical vapour deposition (MOCVD) on stainless steel, type AISI 304. The MOCVD experiments were performed in nitrogen at low pressure (0.17 kPa (1.25 torr)).
The effect of deposition temperature (200 − 380 °C), growth rate, film thickness, and post-deposition thermal treatment on the mechanical properties was studied. The experiments were performed with a scanning-scratch tester. The experiments are based on the estimation of the film adhesion to the substrate by determining a critical load, Lc: the load where the film starts to spall or to delaminate.
The best mechanical properties were obtained with unannealed samples. After thermal annealing the critical load decreases. Regarding the unannealed samples, the critical load increased with increasing film thickness. The deposition temperature and the growth rate had no effect on the critical load.
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References
- 1.
P. Kofstad, High Temperature Corrosion, Elsevier Applied Science Publishers LTD, London and New York (1988).
- 2.
M. Ohring, The Materials Science of Thin Films, Academic Press LTD, London (1992).
- 3.
P.F. Tortorelli, J.R. Keiser, Scripta Metallurgica et Materialia, 25 (1991) 2339.
- 4.
P.F. Tortorelli, J.R. Keiser, K.R. Willson, and W.C. Oliver, in Microscopy of Oxidation, Proc. First Int. Conf. (Univ. of Cambridge, 26-28 March, 1990), ed. M.J. Bennett, and G.W. Lorimer.
- 5.
J. Valli, J. Vac. Sci. Technol., A 4(6) (1987) 3007.
- 6.
P.A. Steinmann, Y. Tardy, and H.E. Hintermann, Thin Solid Films, 154 (1987) 333.
- 7.
E. Hummer, and A.J. Perry, Thin Solid Films, 101 (1983) 243.
- 8.
B. Hammer, A.J. Perry, P. Laeng, and P.A. Steinmann, Thin Solid Films, 96 (1982) 45.
- 9.
P.A. Steinmann, and H.E. Hintemann, J. Vac. Sci. Technol. A, 3(6) (1985) 2394.
- 10.
V.A.C. Haanappel, H.D. van Corbach, T. Fransen, and P.J. Gellings, Materials Science & Engineering, A167 (1993) 179.
- 11.
V.A.C. Haanappel, Alumina Films on Metallic Substrates by MOCVD, PhD-thesis, University of Twente, The Netherlands (1994).
- 12.
Th. Roth, K.H. Kloos, and E. Broszeit, Thin Solid Films, 153 (1987) 123.
- 13.
S.B. Desu, J. Am. Ceram. Soc, 72 (1989) 1615.
- 14.
S.B. Desu, Jap. J. Appl. Phys., 30 (1991) L2123.
- 15.
Y. Ikeda, and M. Yata, Journal de Physique IV, Colloque C9, supplement au Journal de Physique III, 3 (1993) 257.
- 16.
V.A.C. Haanappel, H.D. van Corbach, T. Fransen, and P.J. Gellings, The Effect of Thermal Annealing on the Adherence of Al2O3-Films Deposited by Low Pressure Metal-Organic Chemical Vapour Deposition on AISI-304, Submitted for publication to Oxidation of Metals.
- 17.
D.R. Sigler, Oxidation of Metals, 40(5/6) (1993) 555.
- 18.
D.R. Sigler, Oxidation of Metals, 29(1/2) (1988) 23.
- 19.
D.P. Whittle, and J. Stringer, Philos. Trans. R. Soc. Lond. Ser., A295 (1980) 309.
- 20.
H. Hindam, and D.P. Whittle, Oxidation of Metals, 18(6) (1982) 245.
- 21.
G.C. Wood, and F.H. Stott, High Temperture Corrosion, R.A. Rapp, ed. (NACE, Houston, Texas) 6 (1983) 227.
- 22.
K.L. Luthra, and C.L. Briant, Oxidation of Metals, 26(5/6) (1986) 397.
- 23.
W.J. Quadakkers, Journal de Physique IV, Colloque C9, suppl. J. de Phys. III, 3 (1993) 177.
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Haanappel, V.A.C., van Corbach, H.D., Fransen, T. et al. Scanning Scratch Tests for Evaluating the Adhesion of Thin Oxide Films on Stainless Steel. MRS Online Proceedings Library 356, 863–868 (1994). https://doi.org/10.1557/PROC-356-863
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