Anomalous Diffusion of Implanted Chlorine in Silicon


The diffusion of implanted chlorine in silicon wafers is studied with neutron activation/accelerator mass spectroscopy (NA/AMS). Depth profiles are obtained from as-implanted and annealed samples. While there is a marked difference between the annealed and as-implanted profiles for the lowest implant dose studied, 1013/cm2, the chlorine from the higher dose implants is virtually immobile. The diffusion of implanted chlorine in silicon is characterized by the apparent absence of indiffusion for the experimental conditions studied. However, outdiffusion is rapid at low concentrations for anneal temperatures of 1100°C and above. This behavior is qualitatively similar to that reported for fluorine in silicon at lower temperatures.

This is a preview of subscription content, access via your institution.


  1. 1.

    M. Delfino and M.E. Lunnon, J. Electrochem. Soc. 132, 435 (1985).

    CAS  Article  Google Scholar 

  2. 2.

    D. Elmore, T.Z. Hossain, H.E. Gove, T.K. Hemmick, P.W. Kubik, S. Jiang, J.P. Lavine, and S.-T. Lee, Radiocarbon 31, 292 (1989)

    Article  Google Scholar 

  3. 2a.

    H.E. Gove, P.W. Kubik, P. Sharma, S. Datar, U. Fehn, T.Z. Hossain, J. Koffer, J.P. Lavine, S.-T. Lee, and D. Elmore, Nucl. Instrum. Methods B52, 502 (1990).

    CAS  Article  Google Scholar 

  4. 3.

    S.-P. Jeng, T.-P. Ma, R. Canteri, M. Änderte, and G.W. Rubloff, Appl. Phys. Lett. 61, 1310 (1992).

    CAS  Article  Google Scholar 

  5. 4.

    P.W. Kubik, D. Elmore, T.K. Hemmick, H.E. Gove, U. Fehn, R.T.D. Teng, S. Jiang, and S. Tullai, Nucl. Instrum. Methods B29, 138 (1987).

    CAS  Article  Google Scholar 

  6. 5.

    R.G. Wilson, F.A. Stevie, and C.W. Magee, Secondary Ion Mass Spectrometry. (John Wiley, New York, 1989).

    Google Scholar 

  7. 6.

    J.F. Ziegler, TRIM90, a computer simulation program of the Transport of Ions in Matter.

  8. 7.

    S.A. Datar, Ph.D. thesis, University of Rochester, 1994.

    Google Scholar 

  9. 8.

    T. Maekawa, S. Inoue, M. Aiura, and A. Usami, Semicond. Sei. Technol. 3, 77 (1988).

    CAS  Article  Google Scholar 

Download references

Author information



Corresponding author

Correspondence to Sameer A. Datar.

Rights and permissions

Reprints and Permissions

About this article

Cite this article

Datar, S.A., Gove, H.E., Teng, R. et al. Anomalous Diffusion of Implanted Chlorine in Silicon. MRS Online Proceedings Library 354, 275–280 (1994).

Download citation