Characterization of Au-Mediated a-Si:H Crystallization by In Situ Electrical Measurements

Abstract

The Au-mediated crystallization of a-Si:H has been investigated by in situ electrical measurements and scanning electron microscopy. The a-Si:H structure was prepared by evaporation of Au thin films of different thicknesses (50 - 600 Å ) onto intrinsic glow discharge deposited a-Si:H layers (≈ 5000 Å ). A rapid increase in the electrical resistance was associated to the nucleation and growth of Si crystals inside the Au film. The growth process promotes the accumulation of Au at the Si grain boundaries forming a metallic network. This network controls the electric resistance at the end of the crystallization reaction. The kinetics of transformation has been studied by isothermal treatments over the 140 - 180 °C temperature range. An activation energy of 2.1 eV was measured. An analysis of resistance data obtained by constant heating rate treatments suggest the rupture of the network interconnections at T ≥ 170 °C. SEM pictures showing the formation of Au clusters confirmed this suggestion.

This is a preview of subscription content, access via your institution.

References

  1. 1.

    L. H. Allen, J. W. Mayer, K. N. Tu, and L. C. Feldman, Phys. Rev. B 41, 8213 (1990).

    CAS  Article  Google Scholar 

  2. 2.

    T. J. Konno, and R. Sinclair, Phil. Mag. B 66, 749 (1992).

    CAS  Article  Google Scholar 

  3. 3.

    L. Hultman, A. Robertson, H. Hentzell, E. Engström, and P. A. Psaras, J. Appl. Phys. 62, 3647 (1987).

    CAS  Article  Google Scholar 

  4. 4.

    R. Bisaro, J. Magariñ o, K. Zellana, S. Squelard, P. Germain, and J. F. Morhange, Phys. Rev. B 31, 3568 (1985).

    CAS  Article  Google Scholar 

  5. 5.

    M. J. Thompson, R. J. Nemanich, and C. C. Tsai, Surf. Sci. 132, 250 (1983).

    CAS  Article  Google Scholar 

  6. 6.

    S. R. Herd, P. Chaudhari, and M. H. Brodsky, J. Non-Cryst. Solids 11, 309 (1972).

    Article  Google Scholar 

  7. 7.

    A. A. Pasa, M. B. Schubert, C.-D. Abel, W. Beyer, W. Losch and G. H. Bauer in Amorphous Silicon Technology, edited by M. J. Thompson, Y. Hamakawa, P. G. LeComber, A. Madan and E. Schiff (Mater. Res. Soc. Proc. 258, San Francisco, CA, 1992), pp. 129–134.

  8. 8.

    U. Köster, D. R. Campbell, and K. N. Tu, Thin Solid Films, 53, 129 (1978).

    Article  Google Scholar 

  9. 9.

    A. A. Pasa, PhD Thesis, Federal University of Rio de Janeiro, 1993.

  10. 10.

    M. Avrami, J. Chem. Phys. 9, 177 (1941).

    CAS  Article  Google Scholar 

  11. 11.

    J. W. Christian, The Theory of Transformations in Metals and Alloys PART I, 2nd ed. (Pergamon Press, Oxford, 1975), p. 19.

    Google Scholar 

Download references

Acknowledgments

We would like to thank Dr. Markus Schubert for helpful discussions and Dr. Carlos Gatts for reviewing the manuscript. One of the authors (AAP) wishes to thank to the opportunity to have done part of his PhD work in the group of Prof. W. H. Bloss (IPE/Univ. Stuttgart). We also gratefully acknowledge financial support from brazilian (FINEP/CNPq/CAPES) and german (DAAD, Volkswagen-Stiftung) institutions.

Author information

Affiliations

Authors

Corresponding author

Correspondence to A. A. Pasa.

Rights and permissions

Reprints and Permissions

About this article

Verify currency and authenticity via CrossMark

Cite this article

Pasa, A.A., Achete, C.A., Losch, W. et al. Characterization of Au-Mediated a-Si:H Crystallization by In Situ Electrical Measurements. MRS Online Proceedings Library 311, 105–110 (1993). https://doi.org/10.1557/PROC-311-105

Download citation