Bone Cell Response to Ion Implanted Silicon Wafers

Abstract

Results of preliminary investigations on the electrokinetic characterization and osteoblast morphology of ion implanted silicon wafers are presented. The goal of this study is to modify the surface of a material via ion implantation to control cellular interactions at the prosthesis-body interface.

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Acknowledgement

The authors would like to thank Dr. McMillan and the Central Research Laboratory, Rhode Island Hospital for the TEM work and the Bone Research Laboratory at the University of New South Wales, Sydney Australia for help and support throughout the project.

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Walsh, W.R., Zou, L., Lefkoe, T.P. et al. Bone Cell Response to Ion Implanted Silicon Wafers. MRS Online Proceedings Library 252, 213–220 (1991). https://doi.org/10.1557/PROC-252-213

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