Large Area Photochemical Dry Etching of Polymers with Incoherent Excimer UV Radiation

Abstract

Photochemical dry etching and surface modification of different polymers, e.g., poly-methylmethacrylate (PMMA), polyimid (PI) and poly-ethylene terephthalate (PET) was achieved with an incoherent excimer UV source. Decomposition and etch rates of PMMA were determined as a function of UV intensity and exposure time at different wavelengths {ie39-1} {ie39-2} {ie39-3}. The morphology of the exposed area of PMMA was investigated with SEM. The etching of the polymers can be explained as a result of extensive photooxidation. The results are compared with data obtained from mercury lamp and excimer laser experiments.

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Acknowledgement

The authors would like to thank Dr.J.Demny and U.Feller for SEM investigations.

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Correspondence to Hilmar Esrom.

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Esrom, H., Zhang, JY. & Kogelschatz, U. Large Area Photochemical Dry Etching of Polymers with Incoherent Excimer UV Radiation. MRS Online Proceedings Library 236, 39–45 (1991). https://doi.org/10.1557/PROC-236-39

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