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Electron Beam Induced Decomposition of Palladium Acetate

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Abstract

A focused electron beam has been used to selectively decompose sub micron thick films of palladium acetate, Pd(OOCCH3)2, resulting in the formation of <0.1µm wide Pd rich features. Resistivity of the palladium acetate film decreased when exposed to doses above 500µC/cm2. Annealing to 160°C further reduces the resistivity of the exposed areas to as low as 100µΩcm. XPS analysis of the exposed areas indicate that the Pd is reduced to a metallic state and that the ratio of C and 0 to Pd drops to 1.5 and 0.6, respectively, after exposure. Residual gas analysis during exposure indicates that CO2 and CH3 are the primary volatile products of the decomposition.

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Acknowledgement

This work has been partially supported by the NSF Engineering Research Centers Program through the Center for Advanced Electronic Materials Processing (Grant CDR 8721505).

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Authors and Affiliations

  1. Also at Department of Chemistry, University of North Carolina, Chapel Hill, NC, 27599, USA

    T.J. Stark

  2. Sandia National Laboratories, Albuquerque, NM, 87185, USA

    T.M. Mayer

  3. Center for Advanced Electronic Materials Processing, North Carolina State University, Raleigh, NC, 27695, USA

    P.E. Russell

Authors
  1. T.J. Stark
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  2. T.M. Mayer
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  3. P.E. Russell
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Stark, T., Mayer, T. & Russell, P. Electron Beam Induced Decomposition of Palladium Acetate. MRS Online Proceedings Library 236, 165–170 (1991). https://doi.org/10.1557/PROC-236-165

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  • DOI: https://doi.org/10.1557/PROC-236-165

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