Demonstrating the Utility of Boron Based Precursor Molecules for Selective Area DepositIon in a Scanning Tunnelling Microscope

Abstract

The scanning tunnelling microscope (STM) can be used to selectively deposit material from a gaseous precursor compound. Ultrasmall (less than a 100 nm across) spatial dimensions for selective area deposition may be achieved by this means. In this paper we outline a scheme forselecting and designing main group cluster compounds and organometallics for this type of selective area deposition using nido-decaborane(14) as an example.

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Correspondence to M. Onellion.

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Perkins, F.K., Onellion, M., Lee, S. et al. Demonstrating the Utility of Boron Based Precursor Molecules for Selective Area DepositIon in a Scanning Tunnelling Microscope. MRS Online Proceedings Library 236, 153–158 (1991). https://doi.org/10.1557/PROC-236-153

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