Effect of Annealing on the Dielectric Properties and Microstructure of Tantalum Oxide T14in Films

MRS Online Proceedings Library volume 230, pages357–362(1992)Cite this article

Abstract

Effects of heat treatments on the dielectric properties of tantalum oxide thin films(250Å) deposited on the p-Si substrates by RF reactive sputtering were investigated. The leakage current density was considerably reduced from 10-9 to 10-12A/μm2 at an electric field of 2MV/cm after rapid thermal annealing in O2 at 1000°C, while little leakage reduction was observed after annealing at 500°C. p]The structural changes of tantalum oxide thin film after annealing were examined using high resolution transmission electron microscopy. The leakage reduction after annealing can be attributed to crystallization and reoxidation of the amorphous tantalum oxide thin film.

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Affiliations

  1. Add, Taejeon, Korea

    Chang Hwan Chun & Geun Hong Kim

  2. Etri, Taejeon, Korea

    Kyoung-Soo Yi

Authors
  1. Chang Hwan Chun
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  2. Geun Hong Kim
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  3. Kyoung-Soo Yi
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Correspondence to Chang Hwan Chun.

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Chun, C.H., Kim, G.H. & Yi, KS. Effect of Annealing on the Dielectric Properties and Microstructure of Tantalum Oxide T14in Films. MRS Online Proceedings Library 230, 357–362 (1992). https://doi.org/10.1557/PROC-230-357

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