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Effects of Pulsed Electron Beam Irradiation on Al Single Crystal with Pb Overlayers

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Abstract

The effects of pulsed electron beam irradiation (pulse width 50 ns FWHM, electron energies from 15 to 30 keV and current density in the range of 100 to 2300 A/cm2) on Al-Pb systemsprepared by vacuum evaporation of Pb layers from 500 Å to 2000 Å in thickness over Al single crystals have been investigated by Rutherford backscattering (RBS) and scanning electron microscopy.

The main effects consist in a Pb loss which shows definite features as a function of the incident beam current density and in a mixing of Pb into Al which is unambiguously detected by a selective chemical etching of Pb still unreacted after irradiation.

These experimental results are discussed on the basis of some heat flow model calculations which use Monte-Carlo data for the electron depth dose function.

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Acknowledgements

One of us (V.N.K.) thanks the I.CT.P. - Trieste for financial support. We thank L.E. Laghi for considerable help in computer programming.

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Battaglin, G., Carnera, A., Rose, L.F.D.D. et al. Effects of Pulsed Electron Beam Irradiation on Al Single Crystal with Pb Overlayers. MRS Online Proceedings Library 23, 769–775 (1983). https://doi.org/10.1557/PROC-23-769

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  • DOI: https://doi.org/10.1557/PROC-23-769

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