Ion Beam Sputter Deposition Of Ferroelectric Oxide Thin Films

Abstract

Ferroelectric oxide films have been studied for their potential application as integrated optical materials and nonvolatile memories. Electro-optic properties of potassium niobate (KNbO3) thin films have been measured and the results correlated to the microstructures observed. The growth parameters necessary to obtain single phase perovskite lead zirconate titanate (PZT) thin films are discussed. Hysteresis and fatigue measurements of the PZT films were performed to determine their characteristics for potential memory devices.

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Acknowledgement

The authors would like to acknowledge the National Science Foundation, the Office of Naval Research, and the Defense Advanced Research Projects Agency for support of this work.

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Correspondence to Thomas M. Graettinger or O. Auciello or M. S. Ameen or H. N. Al-Shareef or K. Gifford or A. I. Kingon.

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Graettinger, T.M., Auciello, O., Ameen, M.S. et al. Ion Beam Sputter Deposition Of Ferroelectric Oxide Thin Films. MRS Online Proceedings Library 223, 273 (1991). https://doi.org/10.1557/PROC-223-273

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