Hydrogen Diffusion in N-Type Silicon.Comparison With P-Type Silicon

Abstract

Deuterium diffusion profiles in medium phosphorus doped silicon (1016 and 1017 cm-3) at two different deuteration temperatures (120 and 150°C) are simulated with an improved version of a previously reported model. The new approach which excludes the H2 molecule formation, as applied recently to ptype silicon, allows the determination of kinetic and thermodynamic parameters such as diffusion coefficients, activation and dissociation energies. These parameters 6re compared with those found for p-type silicon and discussed in the light ofavailable data for n-type material.

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Rizk, R., De Mierry, P., Ballutaud, D. et al. Hydrogen Diffusion in N-Type Silicon.Comparison With P-Type Silicon. MRS Online Proceedings Library 209, 573–578 (1990). https://doi.org/10.1557/PROC-209-573

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