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Preparation of Phenylsiloxane Films VIA Solution Deposition Techniques

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Abstract

Thin films (1–10μ thick) can be spin coated on a variety of substrates from formulations containing polyphenylsiloxanes and alkylsilicates. These films may be cured either thermally or photochemically, yielding films with good adherence to the substrate. The combination of photolysis and thermolysis results in changes in the film hardness characteristics. The use of a mask during photocuring results in films which may be developed in either a positive or negative fashion. The preparation of various formulations along with film curing processes will be discussed.

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Authors and Affiliations

  1. Akzo Chemicals Inc., Livingstone Ave., Dobbs Ferry, NY, 10522, USA

    E. W. Burkhardt & J. H. Deatcher

  2. Chisholm Institute of Technology, Department of Chemistry, East Caulfield, Victoria, 3145, Australia

    R. R. Burford

Authors
  1. E. W. Burkhardt
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  2. R. R. Burford
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  3. J. H. Deatcher
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Burkhardt, E.W., Burford, R.R. & Deatcher, J.H. Preparation of Phenylsiloxane Films VIA Solution Deposition Techniques. MRS Online Proceedings Library 180, 767 (1990). https://doi.org/10.1557/PROC-180-767

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  • DOI: https://doi.org/10.1557/PROC-180-767

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