A Study of the In Situ Epitaxial Growth of the 123 Ybco Films from a Stoichiometric Target by Rf Magnetron Sputtering

Abstract

The synthesis parameters have been systematically examined for the in situ growth of high temperature superconducting Y-Ba-Cu-0 thin films from a stoichiometric target by rf magnetron sputtering. By properly adjusting the deposition temperature, the total sputtering (O2+Ar)-pressure and the O2-partial pressure, we have reproducibly obtained 123 YBCO films with a zero resistivity temperature Tcz = 84 K and a transition width of 3 K°. The films so obtained have excellent surface morphology and a surface roughness better than ∼ 5 nm.

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Correspondence to R. L. Meng.

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Meng, R.L., Wang, Y.Q., Sun, Y.Y. et al. A Study of the In Situ Epitaxial Growth of the 123 Ybco Films from a Stoichiometric Target by Rf Magnetron Sputtering. MRS Online Proceedings Library 169, 627–630 (1989). https://doi.org/10.1557/PROC-169-627

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