A Study of the In Situ Epitaxial Growth of the 123 Ybco Films from a Stoichiometric Target by Rf Magnetron Sputtering

MRS Online Proceedings Library volume 169, pages627–630(1989)Cite this article

Abstract

The synthesis parameters have been systematically examined for the in situ growth of high temperature superconducting Y-Ba-Cu-0 thin films from a stoichiometric target by rf magnetron sputtering. By properly adjusting the deposition temperature, the total sputtering (O2+Ar)-pressure and the O2-partial pressure, we have reproducibly obtained 123 YBCO films with a zero resistivity temperature Tcz = 84 K and a transition width of 3 K°. The films so obtained have excellent surface morphology and a surface roughness better than ∼ 5 nm.

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Affiliations

  1. Texas Center for Superconductivity, University of Houston Houston, Texas, 77204-5506, USA

    R. L. Meng, Y. Q. Wang, Y. Y. Sun, Li Gao, P. H. Hor & C. W. Chu

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  1. R. L. Meng
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  2. Y. Q. Wang
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  3. Y. Y. Sun
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  4. Li Gao
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  5. P. H. Hor
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  6. C. W. Chu
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Correspondence to R. L. Meng.

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Meng, R.L., Wang, Y.Q., Sun, Y.Y. et al. A Study of the In Situ Epitaxial Growth of the 123 Ybco Films from a Stoichiometric Target by Rf Magnetron Sputtering. MRS Online Proceedings Library 169, 627–630 (1989). https://doi.org/10.1557/PROC-169-627

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