Automation Features Used with the Halide-Cvd Technique at the AT&T-Microelectronics Production Plant in Reading, Pennsylvania

Abstract

The the Halide-CVD technique is used in both research and development as well as production at AT&T. The unique requirements of the production environment dictate that reactor designs include features to improve reproducibility and maintenance, as well as reduce operator intervention. Features incorporated in the Halide-CVD reactor at AT&T include microprocessor control of valves, mass flow controllers, and furnace temperature setpoints. The unique needs of a production facility, such as process reproducibility, and commonality with standard plant equipment and information systems, will be highlighted.

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Correspondence to Bruce J. Rhoades.

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Rhoades, B.J., Travis, S.J. & Sands, D.G. Automation Features Used with the Halide-Cvd Technique at the AT&T-Microelectronics Production Plant in Reading, Pennsylvania. MRS Online Proceedings Library 145, 231–237 (1989). https://doi.org/10.1557/PROC-145-231

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