Skip to main content
SpringerLink
Log in

Reactive Atom-Surface Scattering the Adsorption and Reaction of Atomic Oxygen on the Si(100) Surface

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

The adsorption and reaction of atomic oxygen on the Si(100) surface has been examined by employing supersonic beam techniques, X-ray photoelectron spectroscopy and mass spectrometry. Atomic oxygen adsorbs with a unit probability of adsorption on the clean Si(100) surface. The probability of adsorption decreases monotonically with increasing coverage. At surface temperatures above approximately 1000 K. the adsorption of atomic oxygen results in the gasification of the substrate, producing SiO(g). In comparison to molecular oxygen for this reaction, where two surface intermediates were implicated, only one surface intermediate is formed from the reaction of atomic oxygen with the Si surface.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. J.R. Engstrom, M.M. Nelson, and T. Engel. to be published.

  2. M.P. D’Evelyn. M.M. Nelson, and T. Engel. Surface Sci. 186, 75 (1987).

    Article  Google Scholar 

  3. S.J. Sibener. R.J. Buss. C.Y. Ng and Y.T. Lee. Rev. Sci. Instrum. 51, 167 (1980).

  4. M.P. Seah and W.A. Dench, Surface Interface Anal. 1, 2 (1979).

    Article  CAS  Google Scholar 

  5. R.E. Walkup and S.I. Raider. Appl. Phys. Lett. 53, 888 (1988).

  6. M.L. Yu and B.N. Eldridge. Phys. Rev. Lett. 58, 1691 (1987).

  7. A.J. Schell-Sorokin and J.E. Demuth. Surface Sci. 157, 273 (1985).

  8. G. Hollinger. J.F. Morar. F.J. Himpsel. G. Hughes and J.L. Jordan, Surface Sci. 168, 609 (1986).

    Article  Google Scholar 

  9. L. Incoccia. A. Balerna. S. Cramm. C. Kunz. F. Senf and I. Storjohann. Surface Sci. 189/190, 453 (1987).

Download references

Author information

Authors and Affiliations

  1. Department of Chemistry, University of Washington, 98195, Seattle, WA, USA

    J. R. Engstrom, M. M. Nelson & T. Engel

Authors
  1. J. R. Engstrom
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. M. M. Nelson
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. T. Engel
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Engstrom, J.R., Nelson, M.M. & Engel, T. Reactive Atom-Surface Scattering the Adsorption and Reaction of Atomic Oxygen on the Si(100) Surface. MRS Online Proceedings Library 131, 245 (1988). https://doi.org/10.1557/PROC-131-245

Download citation

  • Published:

  • DOI: https://doi.org/10.1557/PROC-131-245

Search

Navigation