Abstract
A brief history and present state of beam processing techniques and applications to silicon integrated circuit technology are given. The viability of incorporating pulselaser controlled doping profiles into the emitter-base structure of an advanced bipolar transistor is discussed. The areas of present I.C. technology which will constrain future device development are identified, and the contribution that beam processing can make in removing these constraints is discussed. The beam processing techniques most likely to be found in future I.C. technologies are described.
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References
Laser-Solid Interactions and Laser-Processing (S D Ferris, H J Leamy, J M Poate eds) A.I.P. New York (1979)
Laser and Electron-Beam Processing of Materials (C W White, P S Peercy eds) Academic Press New York (1980)
MRS Symposia Proceedings Volumes 1 (1981), 4 (1982), _, (1983) North-Holland New York
Semiconductor Characterisation Techniques (P A Barnes, G A Rosgonyi eds) 466–526 E.C.S. Princeton N.J. (1978)
Laser and Electron Beam Processing of Electronic Materials (C L Anderson, G K Celler, G A Rosgonyi eds) ECS Pennington N.J. (1980)
A R Kirkpatrick, J A Minucci, A C Greenwald IEEE Trans. Elec. Devices ED-24 429 (1977)
R A McMahon and H Ahmed Electronics Letts. 15 No.2 45 (1979)
R T Hodgson, J E E Baglin, R Pal, J M Neri, D Hammer Appl. Phys. Letts. 37 187 (1980)
R L Cohen, J S Williams, L C Feldman, K W Wost Appl. Phys. Letts. 33 751 (1978)
K Nishiyama, M Arai, N Watanade Jap. J. Appl. Phys. 19 L563 (1980)
R T Fulks, C J Russo, P R Hanley, T I Kamins Appl. Phys. Lett. 39 609 (1981)
C Hill ref. 3 1 361 (1981)
C Hill in Laser Annealing of Semiconductors (J M Poate, James W Mayer eds) 479–558 Academic Press New York (1982)
C Hill, A L Butler, J A Daly in ref. 3 4 579–584 (1982)
J L Benton, C J Doherty, S D Ferris, L C Kimerling, H J Leamy, G K Celler, Ref. 2 430 (1980)
M Mlyao, M Koyanagi, H Tamura, N Hashimoto, T Tokuyama, Jap. J. Appl. Phys. 19–1 129 (1980)
C Hill in ref. 5 26 (1980)
M W Geis, H I Smith, B Y Tsaur, J C C Fan, D J Silversmith, R W Mountain, R L Chapman this volume (1983)
J Graul, A Glasl, H Murrman, 450 IEEE J. Sol. State Circuits SC-11 491 (1976)
J M Shannon In Nuclear Instruments and Methods Section 5 North Holland New York (1980)
R A McMahon, H Ahmed, J D Speight, R M Dobson, ref.5 130 (1980)
J D Speight, A E Glaccum, D Machin, R A McMahon, H Ahmed, ref. 3 1 383 (1981)
A Gat and J F Gibbons Appl. Phys. Letts. 32 142 (1978)
L D Hess, S A Kokorowski, G L Olson, Y M Chi, A Gupta, J B Valdez, Ref. 3 4 633 (1982)
G E J Eggermont, D F Allison, S A Gee, K N Ritz, R J Falster, J F Gibbons, Ref. 3 4 615 (1982)
A Gat, J F Gibbons, T J Magee, J Peng, P Williams, V Deline, C A Evans Jr. Appl. Phys. Lett. 33 389 (1978)
C J Pollard, A E Glaccum, J D Speight Ref.3 4 789 (1982)
J L Benton, G K Celler, D C Jacobson, L C Kimerling, D J Lischner, G L Miller, McD Robinson Ref.3 4 765 (1982)
Acknowledgements
I thank my colleague, Alan Butler, for permission to use some of our unpublished material and Plessey Research (Caswell) for permission to publish. This work has been carried out with the support of the Procurement Executive MOD, sponsored by D.C.V.D.
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Hill, C. The Contribution of Beam Processing to Present and Future Integrated Circuit Technologies. MRS Online Proceedings Library 13, 381–392 (1982). https://doi.org/10.1557/PROC-13-381
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DOI: https://doi.org/10.1557/PROC-13-381