Characterization of TiN Films Prepared by Ion Beam Assisted Deposition


One of the advantages of the ion beam assisted deposition process is its controllability of the processing parameters such as: ion-to-atom arrival ratio and the ion energy. In this study, the effects of the nitrogen ion energy (from 1 KV to 30KV) on the TiN film morphology and microstructures were systematically investigated as a function of ion-to-atom arrival ratios, using TEM, XTEM, SEM, ESCA and other analytical techniques.

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  1. 1.

    B. D. Sartwell, Ion Plating And Implantation: Application to Materials. R. F. Hochman ed., Atlanta, GA, pp. 81-89 (1985)

  2. 2.

    R. N. Bolster, I. L. Singer, R. A. Kant, B. D. Sartwell and C. R. Gossett, presented at International Conference on Metallurgy Coatings, April 11-15, 1988, San Diego, CA

  3. 3.

    G. K. Hubler, D. Van Vechten, E. P. Donovan and R. A. Kant, presented at ASM Conference on Ion Implantation and Plasma Assisted Processes for Industrial Applications, May 22-25, 1988, Atlanta, GA

  4. 4.

    J. E. E. Baglin, MRS Symposium on Thin Films: The Relationship of Structure to Properties, MRS Symposium Proceedings, 47, pp. 3-10 (1985)

  5. 5.

    J. C. Bravman and R. Sinclair, J. Electron Microscopy Technique. 1, pp. 53-61 (1984)

  6. 6.

    H. M. Dauplaise and A. L. Chang,, U. S. Army Materials Technology Laboratory Technical Report (to be published)

  7. 7.

    R. A. Kant, S. A. Dillich, B.D. Sartwell and J. A. Sprague, (presented at this MRS meeting, A3.6/S3.6, Fall 1988)

  8. 8.

    R.MiddletonandA. L.Chang. U.S. Army Materials Technology Laboratory Technical Report. (to be published)

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Chang, A.L., Kant, R.A. Characterization of TiN Films Prepared by Ion Beam Assisted Deposition. MRS Online Proceedings Library 128, 433–438 (1988).

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