Island Structured Dielectric Thin Films by Scalable Self-Assembly

Abstract

A self-assembly driven process to synthesize island-structured dielectric films is presented. An intermetallic reaction in platinized silicon substrates provides preferential growth sites for the complex oxide dielectric (strontium-doped lead zirconate titanate) layer. Microscopy and spectroscopy analyses have been used to propose a mechanism for this structuring process. This provides a simple and scalable process to synthesize films with increased surface area for sensors, especially those materials with a complex chemistry.

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Sriram, S., Bhaskaran, M. & Mitchell, A. Island Structured Dielectric Thin Films by Scalable Self-Assembly. MRS Online Proceedings Library 1253, 1029 (2010). https://doi.org/10.1557/PROC-1253-K10-29

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