Island Structured Dielectric Thin Films by Scalable Self-Assembly

MRS Online Proceedings Library volume 1253, Article number: 1029 (2010) Cite this article

Abstract

A self-assembly driven process to synthesize island-structured dielectric films is presented. An intermetallic reaction in platinized silicon substrates provides preferential growth sites for the complex oxide dielectric (strontium-doped lead zirconate titanate) layer. Microscopy and spectroscopy analyses have been used to propose a mechanism for this structuring process. This provides a simple and scalable process to synthesize films with increased surface area for sensors, especially those materials with a complex chemistry.

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Affiliations

  1. Microelectronics and Materials Technology Centre and Platform Technologies Research Institute, School of Electrical and Computer Engineering, RMIT University, Victoria, GPO Box 2476, 3001, Melbourne, Australia

    Sharath Sriram, Madhu Bhaskaran & Arnan Mitchell

Authors
  1. Sharath Sriram
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  2. Madhu Bhaskaran
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  3. Arnan Mitchell
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Sriram, S., Bhaskaran, M. & Mitchell, A. Island Structured Dielectric Thin Films by Scalable Self-Assembly. MRS Online Proceedings Library 1253, 1029 (2010). https://doi.org/10.1557/PROC-1253-K10-29

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