Skip to main content
SpringerLink
Log in

Direct writing of ZrO2 and TiO2 nanostructures by ArF lithography

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

We achieved the preparation of nanostructures based on negative tone inorganic resists by DUV lithography (193 nm). This entails the preparation of a complex of a transition metal by reaction between the metal alkoxide and a suitable ligand. The reaction was carried out in a solvent. Then, a partial hydrolysis of the complex allowed forming metal-oxides inorganic chains by condensation with good film-forming and photopatterning properties. This step corresponds to the synthesis of multifunctional oligomers that can be crosslinked by DUV irradiation.

We obtained well-defined patterns exhibiting low rugosity with width down to 75 nm. An achromatic interferometer based on an ArF excimer laser was used to write the nanostructures. The sensitivity of the resin at 193 nm is in the order of magnitude of organic photoresists used in the microelectronics industry.

The photoinduced processes were studied with care in order to state the physico-chemical phenomena occurring upon DUV-irradiation. FTIR, XPS and XRD were used for characterizing the material structure after irradiation and thermal treatment. Nanostructures were studied by AFM.

The main interest of this resist is that after irradiation, the material is mainly inorganic. It can even be totally mineralized through a subsequent pyrolysis procedure. The process is compatible with a wide range of chemicals (ZrO2, TiO2 …). Using lithographic route, it is possible to obtain such nanostructures on relatively wide surfaces. With this new process, we are targeting applications in microelectronics, optics, photonics, photocatalysis, photovoltaic…

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. Henzie J., Barton J. E., Stender C. L., Odom T. W. Acc. Chem. Res. 39, 249 (2006)

    Article  CAS  Google Scholar 

  2. Small 2, 700 (2006)

  3. Nie Z., Kumacheva E. Nature Mater. 7, 277 (2008)

    Article  CAS  Google Scholar 

  4. Saifullah M.S.M., Subramanian K.R.V., Tapley E., Kang D.J., Welland M.E., Butler M. Nanotechnology 3(11), 1587 (2003)

  5. Thomas I.M. SPIE 2288, 50 (1994)

  6. Belleville P., Bonnin C., Priotton J.J. J. Sol–gel Sci. Technol. 19, 223 (2000)

  7. Belleville P., Prené P., Bonnin C., Beaurain L., Montouillout Y., Lavastre E. SPIE 5250, 196 (2003)

  8. Zhang Q.Y., Shen J., Wang J., Wu G.M., Chen L.Y. Int. J. Inorg. Mater. 2, 319 (2000)

  9. Tian G.L., Huang J.B., Wang T., He H.B., Shao J.D. Appl. Surf. Sci. 239, 201 (2005)

  10. Soppera O., Croutxe-Barghorn C. J. Polym. Sci., Part A: Polym. Chem. 41, 716 (2003)

    Article  CAS  Google Scholar 

  11. Croutxe-Barghorn C., Soppera O., Chevallier M. Macromol. Mater. Engin. 288(3), 219 (2003)

    Article  CAS  Google Scholar 

  12. Kintaka K., Nishii J., Tohge N. Applied Optics 39(4), 489 (2000)

    Article  CAS  Google Scholar 

  13. Ridaoui H., Wieder F., Ponche A., Soppera O., Nanotechnology, 21, 065303 (2010)

    Article  Google Scholar 

  14. Chochos C.L., Ismailova E., Brochon C., Leclerc N., Tiron R., Sourd C., Bandelier P., Foucher J., Ridaoui H., Dirani A., Soppera O., Perret D., Brault C., Serra C., Hadziioannou G. Adv. Mater. 21, 1121 (2009)

Download references

Author information

Authors and Affiliations

  1. Institut de Sciences des Matériaux de Mulhouse (IS2M), CNRS LRC 7228, 15 rue Jean Starcky BP 2488, 68057, MULHOUSE Cedex, France

    Hassan Ridaoui, Ali Dirani, Fernand Wieder & Olivier Soppera

Authors
  1. Hassan Ridaoui
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Ali Dirani
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Fernand Wieder
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Olivier Soppera
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Olivier Soppera.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Ridaoui, H., Dirani, A., Wieder, F. et al. Direct writing of ZrO2 and TiO2 nanostructures by ArF lithography. MRS Online Proceedings Library 1247, 1007 (2009). https://doi.org/10.1557/PROC-1247-C10-07

Download citation

  • Published:

  • DOI: https://doi.org/10.1557/PROC-1247-C10-07

Search

Navigation