A General Approach to Patterning Micron-Scale Particles

Abstract

Multiple techniques have been developed to assemble micro- or nanostructured materials into well-defined patterns. These techniques are, however, often dependent on the size, shape, composition and/or surface chemistry of the structures being patterned. We have developed a general approach to pattern materials with a wide range of physical and chemical characteristics. We are able to assemble these materials into isolated or interconnected patterns covering areas up to ∼1 mm2.

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Correspondence to Nathanael Sieb.

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Sieb, N., Gates, B.D. A General Approach to Patterning Micron-Scale Particles. MRS Online Proceedings Library 947, 324 (2006). https://doi.org/10.1557/PROC-0947-A03-24

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